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Kwanghwyi Im
Assistant Manager at Dongjin Semichem Co Ltd
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Publications (4)
Proceedings Article | 29 March 2006 Paper
Resist dissolution behavior according to protecting group in polymer
Kwanghwyi Im, Jin Jegal, Jungkook Park, Deogbae Kim, Jaehyun Kim
Proceedings Volume 6153, 61533Q (2006) https://doi.org/10.1117/12.655458
KEYWORDS: Polymers, Line width roughness, Lithography, Electroluminescence, Deep ultraviolet, Photoresist processing, Photomasks, Scanning electron microscopy, Temperature metrology, Chemically amplified resists
Proceedings Article | 12 June 2003 Paper
Effects of quencher ability on profile in chemically amplified resist system
Deogbae Kim, Hyun-Jin Kim, Sook-Hee Cho, Dong-Hwal Lee, Kwang-Hyi Im, Min-Ja Yoo, Sang-Hyang Lee, Jaehyun Kim, Jin-Soo Kim, Hyeong-Soo Kim
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485161
KEYWORDS: Diffusion, Lithography, Polymers, Silicon, Line edge roughness, Chemically amplified resists, Photoresist processing, Semiconducting wafers, Coating, Etching
Proceedings Article | 24 July 2002 Paper
Synergic effect of acetal-based resin by blending with poly[4-hydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene (P(HS-TBA-CBPS)) on the profiles of 248 n
Hyun-Jin Kim, Yoon-Sik Chung, Dong Lee, Sook Cho, Kwang Im, Yun-Gill Yim, Deog-Bae Kim, Jae-Hyun Kim
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474265
KEYWORDS: Polymers, Lithography, Line edge roughness, Polymerization, Transmittance, Scanning electron microscopy, Etching, Manganese, Chemically amplified resists, Edge roughness
Proceedings Article | 24 July 2002 Paper
Insertion effects of various acid sensitive groups into acetal-type polymer on the profile of 248-nm chemically amplified resist
Yoon-Sik Chung, Hyun-Jin Kim, Sook Cho, Dong Lee, Kwang Im, Yun-Gill Yim, Deog-Bae Kim, Jae-Hyun Kim
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474266
KEYWORDS: Polymers, Line edge roughness, Carbonates, Lithography, Interfaces, Hydrogen, Molecules, Annealing, Diffusion, Chemically amplified resists
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