Mr. Lee E. Trimble Profile

Lee E. Trimble

at Lucent Technologies

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Author

Publications (8)

Proceedings Article | 5 July 2000 Paper

High-density lithography using attenuated phase-shift mask and negative resist

Stanley Pau, Raymond Cirelli, Kevin Bolan, Allen Timko, John Frackoviak, Pat Watson, Lee Trimble, James Blatchford, Omkaram Nalamasu

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389015

KEYWORDS: Photomasks, Photoresist materials, Phase shifts, Lithography, Binary data, Manufacturing, Critical dimension metrology, Printing, Microelectronics, Integrated circuits

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Proceedings Article | 29 June 1998 Paper

New variable-transmission illumination technique optimized with design rule criteria

Raymond Cirelli, Masis Mkrtchyan, Pat Watson, Lee Trimble, Gary Weber, David Windt, Omkaram Nalamasu

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310739

KEYWORDS: Lithographic illumination, Carbon, Photomasks, Fiber optic illuminators, Lithography, Quartz, Diffraction, Transmittance, Tolerancing, Software development

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Proceedings Article | 8 June 1998 Paper

Toward a unified advanced CD-SEM specification for sub-0.18-um technology

John Allgair, Charles Archie, G. Banke, E. Hal Bogardus, Joseph Griffith, Herschel Marchman, Michael Postek, Lumdas Saraf, Jerry Schlesinger, Bhanwar Singh, Neal Sullivan, Lee Trimble, Andras Vladar, Arnold Yanof

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308724

KEYWORDS: Semiconducting wafers, Metrology, Pattern recognition, Scanning electron microscopy, Contamination, Lithography, Calibration, Standards development, Wafer testing, Electron microscopes

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Proceedings Article | 27 December 1996 Paper

Lithography tricks and tribulations

Joseph Garofalo, Pat Watson, Lee Trimble, Raymond Cirelli, Albert Colina, Ilya Grodnensky, B. Herrero, A. Dunbar, Frederick Peiffer, R. Takahashi, Regine Tarascon-Auriol, Willie Yarbrough, Ludwik Zych

Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262814

KEYWORDS: Photomasks, Optical proximity correction, Deep ultraviolet, Lithography, Resolution enhancement technologies, Semiconducting wafers, Binary data, Mask making, Process modeling, Optical lithography

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Proceedings Article | 24 June 1993 Paper

Performance of the Hampshire Instruments Model 5000 proximity x-ray stepper

John Frackoviak, George Celler, Charles Jurgensen, R. Kola, Anthony Novembre, Lee Trimble, David Tomes

Proceedings Volume 1924, (1993) https://doi.org/10.1117/12.146508

KEYWORDS: Semiconducting wafers, X-rays, Photomasks, Instrument modeling, Control systems, Optical alignment, Critical dimension metrology, Photoresist processing, Metrology, X-ray lithography

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Proceedings Article | 9 July 1992 Paper

Evaluation of a laser-based proximity x-ray stepper

George Celler, John Frackoviak, Richard Freeman, Charles Jurgensen, R. Kola, Anthony Novembre, Larry Thompson, Lee Trimble, David Tomes

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136015

KEYWORDS: Semiconducting wafers, X-rays, Photomasks, Optical alignment, X-ray sources, Plasma, Silicon, X-ray lithography, Lithography, Pulsed laser operation

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Proceedings Article | 9 July 1992 Paper

Production of x-ray mask blanks for a point source stepper

Lee Trimble, George Celler, John Frackoviak, James Liddle, Gary Weber

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136016

KEYWORDS: Silicon, Photomasks, X-rays, Glasses, Transmittance, X-ray optics, Low pressure chemical vapor deposition, X-ray lithography, Synchrotrons, Optics manufacturing

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Proceedings Article | 1 May 1990 Paper

Control of optical and mechanical properties of polycrystalline silicon membranes for x-ray masks

Lee Trimble, George Celler, John Frackoviak

Proceedings Volume 1263, (1990) https://doi.org/10.1117/12.20164

KEYWORDS: Silicon, Glasses, Photomasks, Semiconducting wafers, Low pressure chemical vapor deposition, Silica, X-rays, X-ray technology, Transmittance, X-ray lithography

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Showing 5 of 8 publications

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