Mr. Tsung-Wei Lin Profile

Tsung-Wei Lin

at Winbond Electronics Corp.

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Author

Publications (4)

Proceedings Article | 10 April 2024 Poster + Paper

Using pattern analysis to improve process window qualification cycle time

Tsung-Wei Lin, Hung-Yu Lin, Meng-Shiun Chiang, Jung-Kuan Huang, Jason Sweis, Philippe Hurat, Chung-Chen Hsu, Chun-Sheng Wu, Chao-Yi Huang, Ya-Chieh Lai

Proceedings Volume 12954, 129541B (2024) https://doi.org/10.1117/12.3009892

KEYWORDS: Semiconducting wafers, Yield improvement, Tunable filters, Inspection, Image classification, Design, Scanning electron microscopy, Optical alignment, Wafer inspection, Defect inspection

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Proceedings Article | 28 April 2023 Paper

Constructing layout hierarchy for high-efficiency OPC flow

Tsung-Wei Lin, Hung-Yu Lin, Mang-Shiun Chiang, Shi-Cheng Yeh, Jason Sweis, Philippe Hurat, Tung-Yu Wu, Chun-Sheng Wu, Chao-Yi Huang, Ya-Chieh Lai

Proceedings Volume 12495, 124951N (2023) https://doi.org/10.1117/12.2657649

KEYWORDS: Optical proximity correction, Design and modelling, Lithography, Manufacturing, Electronic design automation, Resolution enhancement technologies, Optics manufacturing, Image segmentation

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Proceedings Article | 13 June 2022 Presentation + Paper

Pareto front optimization for enhanced model prediction accuracy

David Fryer, Ignat Moskalenko, Tung-Yu Wu, Meng-Shiun Chiang, Chun Yen Liao, Tsung-Wei Lin, Chun-Sheng Wu, Chao-Yi Huang, Luke Lo, Xiang Fang, Germain Fenger, Farruh Shahidi

Proceedings Volume 12052, 120520Q (2022) https://doi.org/10.1117/12.2614118

KEYWORDS: Optimization (mathematics), Calibration, Data modeling, Optical proximity correction, Binary data, Performance modeling, Genetic algorithms, Process modeling, Computer simulations, Precision calibration

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Proceedings Article | 26 May 2022 Poster + Paper

OPC optimization and hotspot detection using pattern diffing

Tsung-Wei Lin, Chun Yen Liu, Hung-Yu Lin, Mang-Shiun Chiang, Jason Sweis, Philippe Hurat, Chun Yen Liao, Chun-Sheng Wu, Chao-Yi Huang, Ya-Chieh Lai

Proceedings Volume 12052, 120521E (2022) https://doi.org/10.1117/12.2612476

KEYWORDS: Optical proximity correction, Image classification, Databases, Transistors, Semiconductor manufacturing, Reliability, Profiling, Manufacturing, Library classification systems, Integrated circuits

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