Mr. Lionel Riviere Cazaux Profile

Lionel Riviere Cazaux

at GLOBALFOUNDRIES Inc

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Author

Publications (4)

Proceedings Article | 20 March 2018 Paper

Pre-PDK block-level PPAC assessment of technology options for sub-7nm high-performance logic

L. Liebmann, G. Northrop, M. Facchini, L. Riviere Cazaux, Z. Baum, N. Nakamoto, K. Sun, D. Chanemougame, G. Han, V. Gerousis

Proceedings Volume 10588, 1058808 (2018) https://doi.org/10.1117/12.2297634

KEYWORDS: Metals, Logic, Reliability, New and emerging technologies, Optical lithography, Manufacturing, Electronic design automation

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Proceedings Article | 13 March 2009 Paper

Layout electrical cooptimization for increased tolerance to process variations

Lionel Riviere-Cazaux, Philippe Hurat, Bala Kasthuri, Larry Layton, Nishath Verghese

Proceedings Volume 7275, 727506 (2009) https://doi.org/10.1117/12.813969

KEYWORDS: Design for manufacturing, Lithography, Field effect transistors, Optimization (mathematics), Logic, Tolerancing, Reliability, Photomasks, Silicon, Transistors

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Proceedings Article | 13 March 2009 Paper

Practical implementation of via and wire optimization at the SoC level

Chi-Min Yuan, Guy Assad, Bob Jarvis, Marc Olivares, Lionel Riviere Cazaux, Puneet Sharma, Jayathi Subramanian, Matt Thompson, Kevin Wu

Proceedings Volume 7275, 72750S (2009) https://doi.org/10.1117/12.813396

KEYWORDS: Design for manufacturing, Metals, Optical proximity correction, System on a chip, Yield improvement, Semiconducting wafers, Manufacturing, Reliability, Semiconductors, Electronic design automation

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Proceedings Article | 5 May 2005 Paper

Investigation of model-based physical design restrictions

Kevin Lucas, Stanislas Baron, Jerome Belledent, Robert Boone, Amandine Borjon, Christophe Couderc, Kyle Patterson, Lionel Riviere-Cazaux, Yves Rody, Frank Sundermann, Olivier Toublan, Yorick Trouiller, Jean-Christophe Urbani, Karl Wimmer

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.601105

KEYWORDS: Model-based design, Optical proximity correction, Optical lithography, Data modeling, Lithography, Systems modeling, Semiconductors, Resolution enhancement technologies, Reticles, Semiconducting wafers

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