Prof. Liyuan Wang Profile

Prof. Liyuan Wang

at Beijing Normal Univ

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 27 March 2014 Paper

Novel polymeric sulfonium photoacid generator and its application for chemically amplified photoresists

Juan Liu, Yu Qiao, Liyuan Wang

Proceedings Volume 9051, 905124 (2014) https://doi.org/10.1117/12.2046217

KEYWORDS: Polymers, Photoresist materials, Polymer thin films, Lithography, Absorption, Glasses, Line edge roughness, Ultraviolet radiation, Optical lithography, Scanning electron microscopy

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Proceedings Article | 20 March 2012 Paper

A novel single-component resist based on poly (4-hydroxylstyrene) applicable for EUV lithography

Juan Liu, Min Li, Liyuan Wang

Proceedings Volume 8325, 83251H (2012) https://doi.org/10.1117/12.916970

KEYWORDS: Polymers, Absorption, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Photoresist materials, Sodium, FT-IR spectroscopy, Photolysis, Ultraviolet radiation

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Proceedings Article | 16 April 2011 Paper

Study on a few α-disulfone compounds as photoacid generators

Dongfang Guo, Juan Liu, Liyuan Wang

Proceedings Volume 7972, 79722D (2011) https://doi.org/10.1117/12.879296

KEYWORDS: Quantum efficiency, Photolysis, Absorption, Ultraviolet radiation, Photoresist materials, Solids, Bioalcohols, Mercury, Lamps, Absorbance

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Proceedings Article | 31 March 2010 Paper

Molecular glass positive i-line photoresist materials containing 2,1,4-DNQ and acid labile group

Liyuan Wang, Jinxing Yu, Na Xu

Proceedings Volume 7639, 76392D (2010) https://doi.org/10.1117/12.847019

KEYWORDS: Glasses, Photoresist materials, Lithography, Polymers, Chemistry, Absorption, FT-IR spectroscopy, Photolysis, Nitrogen, Line edge roughness

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Proceedings Article | 3 April 2008 Paper

The synthesis of novel ester acetal polymers and their application for chemically amplified positive i-line photoresist

Liyuan Wang, Yongen Huo, Fanrong Kong

Proceedings Volume 6923, 69233R (2008) https://doi.org/10.1117/12.773577

KEYWORDS: Polymers, Photoresist materials, Lithography, Polymerization, Absorption, FT-IR spectroscopy, Chemistry, Mercury, Chemically amplified resists, Catalysis

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Proceedings Article | 26 March 2008 Paper

Molecular glass photoresists based on acidolysis of acetal compounds

Liyuan Wang, Xiaoxiao Zhai, Na Xu

Proceedings Volume 6923, 69231K (2008) https://doi.org/10.1117/12.774605

KEYWORDS: Glasses, Photoresist materials, Lithography, Absorption, Polymers, Mercury, Organic materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness

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Proceedings Article | 2 April 2007 Paper

Novel 193-nm positive photoresist composed of ester acetal polymer without phenyl group

Liyuan Wang, Xiaoxiao Zhai, Yongen Huo

Proceedings Volume 6519, 65192H (2007) https://doi.org/10.1117/12.711703

KEYWORDS: Polymers, Polymer thin films, Photoresist materials, Absorption, Transparency, Ultraviolet radiation, Polymerization, Quartz, Lithography, FT-IR spectroscopy

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