Mr. Louis Markoya Profile

Louis Markoya

Engineer at ASML

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 7 March 2008 Paper

High-n immersion lithography

Harry Sewell, Jan Mulkens, Paul Graeupner, Diane McCafferty, Louis Markoya, Sjoerd Donders, Rogier Cortie, Ralph Meijers, Fabrizio Evangelista, Nandarisi Samarakone

Proceedings Volume 6924, 692415 (2008) https://doi.org/10.1117/12.773071

KEYWORDS: Semiconducting wafers, Water, Contamination, Absorption, Microfluidics, Immersion lithography, Transparency, Optical components, Ultraviolet radiation, Pulsed laser operation

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Proceedings Article | 27 March 2007 Paper

Extending immersion lithography with high-index materials: results of a feasibility study

Harry Sewell, Jan Mulkens, Paul Graeupner, Diane McCafferty, Louis Markoya, Sjoerd Donders, Nandasiri Samarakone, Rudiger Duesing

Proceedings Volume 6520, 65201M (2007) https://doi.org/10.1117/12.711139

KEYWORDS: Microfluidics, Absorption, Semiconducting wafers, Neodymium, Water, Immersion lithography, Refractive index, Critical dimension metrology, Glasses, Contamination

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Proceedings Article | 15 March 2006 Paper

The next phase for immersion lithography

Harry Sewell, Jan Mulkens, Diane McCafferty, Louis Markoya, Bob Streefkerk, Paul Graeupner

Proceedings Volume 6154, 615406 (2006) https://doi.org/10.1117/12.657574

KEYWORDS: Semiconducting wafers, Neodymium, Refractive index, Water, Immersion lithography, Microfluidics, Optical lithography, Critical dimension metrology, Absorption, Glasses

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SPIE Journal Paper | 1 July 2005

Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k₁ of 0.25

Roger French, Harry Sewell, Min Yang, Sheng Peng, Diane McCafferty, Weiming Qiu, Robert Wheland, Michael Lemon, Louis Markoya, Michael Crawford

JM3, Vol. 4, Issue 03, 031103, (July 2005) https://doi.org/10.1117/12.10.1117/1.2039953

KEYWORDS: Refractive index, Water, Oscillators, Absorption, Absorbance, Lithography, Immersion lithography, Microfluidics, Microfluidic imaging, Glasses

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Proceedings Article | 4 May 2005 Paper

32nm node technology development using interference immersion lithography

Harry Sewell, Diane McCafferty, Louis Markoya, Eric Hendrickx, Jan Hermans, Kurt Ronse

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601012

KEYWORDS: Refractive index, Immersion lithography, Lithography, Polarization, Water, Image resolution, Imaging systems, Printing, Glasses, Absorption

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Proceedings Article | 7 July 1997 Paper

Micrascan III: performance of a third-generation catadioptric step-and-scan lithographic tool

Daniel Cote, Keith Andresen, David Cronin, Hilary Harrold, Marc Himel, J. Kane, Joe Lyons, Louis Markoya, Christopher Mason, Diane McCafferty, Matthew McCarthy, Geoffrey O'Connor, Harry Sewell, David Williamson

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276001

KEYWORDS: Combined lens-mirror systems, Lithography, Imaging systems, Optical lithography, Reticles, Semiconducting wafers, Fiber optic illuminators, Image resolution, Image quality

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Showing 5 of 6 publications

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