Dr. Luisa D. Bozano Profile

Dr. Luisa D. Bozano

Director Patterning at Applied Materials Inc

SPIE Involvement:

Conference Program Committee | Author

Publications (18)

Proceedings Article | 9 April 2024 Presentation + Paper

Presentation + Paper

Performance comparison of photosensitive polyimides for high-resolution dual-damascene schemes for FOWLP packaging applications

Luisa Bozano, Roger Quon, Ben Briggs, Ryan Ley, Athena Pang, Peng Suo, Prayudi Lianto, Andy Yong, Arvind Sundarrajan, Jorge Fernandez, Niranjan Khasgiwale, C. C. Chuang, Jang Fung Chen, Siddarth Krishnan, Mike Chudzik, Chris Bencher

Proceedings Volume 12957, 129570X (2024) https://doi.org/10.1117/12.3010203

KEYWORDS: Lithography, Packaging, Polyimides, Materials properties, Electrical properties, Dielectrics, Image processing, Film thickness, Chemical mechanical planarization, Advanced packaging

Read Abstract +

Proceedings Article | 4 March 2019 Paper

Paper

High throughput analysis of plankton morphology and dynamic

Sujoy Kumar Biswas, Thomas Zimmerman, Lucrezia Maini, Aminat Adebiyi, Luisa Bozano, Cecelia Brown, Vito Paolo Pastore, Simone Bianco

Proceedings Volume 10881, 1088109 (2019) https://doi.org/10.1117/12.2509168

KEYWORDS: Video, Chemical analysis, Machine vision, Computer vision technology, Microscopes, Computing systems, Microorganisms, Visualization, Imaging systems, Machine learning

Read Abstract +

Proceedings Article | 17 October 2014 Paper

Paper

Characterization of a new polarity switching negative tone e-beam resist for 14nm and 10nm logic node mask fabrication and beyond

T. Faure, A. Zweber, L. Bozano, M. Sanchez, R. Sooriyakumaran, L. Sundberg, Y. Sakamoto, S. Nash, M. Kagawa, T. Isogawa, T. Senna, M. Tanabe, T. Komizo, I. Yoshida, K. Masunaga, S. Watanabe, Y. Kawai, J. Malenfant, R. Bowley

Proceedings Volume 9235, 92350P (2014) https://doi.org/10.1117/12.2069031

KEYWORDS: Etching, Opacity, Switching, SRAF, Dry etching, Critical dimension metrology, Logic, Scanning electron microscopy, Manufacturing, Image resolution

Read Abstract +

Proceedings Article | 27 March 2014 Paper

Paper

ICE: Ionic contrast enhancement for organic solvent negative tone develop

Linda Sundberg, Gregory Wallraff, Luisa Bozano, Hoa Truong, Martha Sanchez, Dario Goldfarb, Karen Petrillo, William Hinsberg

Proceedings Volume 9051, 90510S (2014) https://doi.org/10.1117/12.2046762

KEYWORDS: Image processing, Ions, Photoresist processing, Semiconducting wafers, Polymers, Lithium, Standards development, Lithography, Image quality standards, Reflectivity

Read Abstract +

Proceedings Article | 27 March 2014 Paper

Paper

Spin-on organic hardmask for topo-patterned substrate

Kazuhiko Komura, Yoshi Hishiro, Goji Wakamatsu, Yoshio Takimoto, Tomoki Nagai, Tooru Kimura, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Noel Arellano, Srinivasan Balakrishnan, Luisa Bozano, Ananthakrishnan Sankaranarayanan, Krishna Bajjuri, Daniel Sanders, Carl Larson, Anuja DeSilva, Martin Glodde

Proceedings Volume 9051, 905115 (2014) https://doi.org/10.1117/12.2046357

KEYWORDS: Fourier transforms, Chemical vapor deposition, Photoresist materials, Resistance, Carbon, Photomasks, Optical lithography, Lithography, Glasses

Read Abstract +

Proceedings Article | 9 September 2013 Paper

Paper

Defects on high-resolution negative-tone resist: "The revenge of the blobs"

M. Sanchez, L. Sundberg, L. Bozano, R. Sooriyakumaran, D. Sanders, T. Senna, M. Tanabe, T. Komizo, I. Yoshida, A. Zweber

Proceedings Volume 8880, 88800V (2013) https://doi.org/10.1117/12.2028753

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Switching, Chromium, Switches, Silicon, Ultraviolet radiation, Lamps, Optical microscopes

Read Abstract +

Proceedings Article | 29 March 2013 Paper

Paper

Monitoring the evolution of line edge roughness during resist development using an analog of quenched flow kinetics

M. Sanchez, L. Sundberg, G. Wallraff, W. Hinsberg, L. Bozano, H. Truong, K. Petrillo

Proceedings Volume 8682, 868218 (2013) https://doi.org/10.1117/12.2010966

KEYWORDS: Line edge roughness, Scanning electron microscopy, Analog electronics, Glasses, Extreme ultraviolet, Photoresist processing, Resist chemistry, Photoresist materials, Semiconducting wafers, Photomicroscopy

Read Abstract +

Proceedings Article | 8 November 2012 Paper

Paper

Study and comparison of negative tone resists for fabrication of bright field masks for 14nm node

Amy Zweber, Tom Faure, Anne McGuire, Linda Sundberg, Ratnam Sooriyakumaran, Martha Sanchez, Luisa Bozano, Tasuku Senna, Yuki Fujita, Yoshiyuki Negishi, Masahito Tanabe, Takahiro Kaneko

Proceedings Volume 8522, 85220S (2012) https://doi.org/10.1117/12.976878

KEYWORDS: Photomasks, Line edge roughness, SRAF, Manufacturing, Opacity, Critical dimension metrology, Phase shifts, Binary data, Photoresist processing, Electron beam lithography

Read Abstract +

Proceedings Article | 8 November 2012 Paper

Paper

Conductive layer for charge dissipation during electron-beam exposures

Luisa Bozano, Ratnam Sooriyakumaran, Takayuki Nagasawa, Satoshi Watanabe, Yoshio Kawai, Shinpei Kondo, Jun Kotani, Masayuki Kagawa, Linda Sundberg, Martha Sanchez, Elizabeth Lofano, Charles Rettner, Tasuku Senna, Thomas Faure

Proceedings Volume 8522, 85220O (2012) https://doi.org/10.1117/12.977181

KEYWORDS: Image quality, Photomasks, Semiconducting wafers, Polymers, Electron beam lithography, Line edge roughness, Image registration, Photoresist processing, Neodymium, Ions

Read Abstract +

Proceedings Article | 23 March 2012 Paper

Paper

EUV mask line edge roughness

Amy Zweber, Emily Gallagher, Martha Sanchez, Tasuku Senna, Yoshiyuki Negishi, Toshio Konishi, Anne McGuire, Luisa Bozano, Phil Brock, Hoa Truong

Proceedings Volume 8322, 83220O (2012) https://doi.org/10.1117/12.916291

KEYWORDS: Line edge roughness, Photomasks, Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Edge detection, Image filtering, EUV optics, Pixel resolution, Line width roughness

Read Abstract +

Proceedings Article | 20 March 2012 Paper

Paper

Conductive layer for charge dissipation during electron-beam exposures

Luisa Bozano, Ratnam Sooriyakumaran, Linda Sundberg, Martha Sanchez, Elizabeth Lofano, Charles Rettner, Takayuki Nagasawa, Satoshi Watanabe, Yoshio Kawai, Nagarajan Palavesam, Gustavo Gandara Montano

Proceedings Volume 8325, 83250X (2012) https://doi.org/10.1117/12.916756

KEYWORDS: Image quality, Polymers, Semiconducting wafers, Gold, Electron beams, Resistance, Lithography, Chemically amplified resists, Thin film coatings, Neodymium

Read Abstract +

Proceedings Article | 20 March 2012 Paper

Paper

Investigation of pattern wiggling for spin-on organic hardmask materials

Goji Wakamatsu, Kentaro Goto, Yoshi Hishiro, Taiichi Furukawa, Satoru Murakami, Masayuki Motonari, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Anuja DeSilva, Noel Arellano, Luisa Bozano, Carl Larson, Martin Glodde, Ratnam Sooriyakumaran

Proceedings Volume 8325, 83250T (2012) https://doi.org/10.1117/12.915698

KEYWORDS: Etching, Resistance, Hydrogen, Chemical vapor deposition, Fluorine, Fourier transforms, Optical lithography, Critical dimension metrology, Double patterning technology, Extreme ultraviolet

Read Abstract +

Proceedings Article | 16 April 2011 Paper

Paper

Extending photo-patternable low-κ concept to 193nm lithography and e-beam lithography

Qinghuang Lin, A. Nelson, L. Bozano, P. Brock, S. Cohen, B. Davis, R. Kwong, E. Liniger, D. Neumayer, J. Rathore, H. Shobha, R. Sooriyakumaran, S. Purushothaman, R. Miller, R. Allen, T. Spooner, R. Wisnieff

Proceedings Volume 7972, 79721A (2011) https://doi.org/10.1117/12.881571

KEYWORDS: Dielectrics, Electron beam lithography, Lithography, Photomasks, Silicon, Scanning electron microscopy, Scanners, Copper, Back end of line, Optical lithography

Read Abstract +

Proceedings Article | 16 April 2011 Paper

Paper

Bound PAG resists: an EUV and electron beam lithography performance comparison of fluoropolymers

Luisa Bozano, Phillip Brock, Hoa Truong, Martha Sanchez, Gregory Wallraff, William Hinsberg, Robert Allen, Masaki Fujiwara, Kazuhiko Maeda

Proceedings Volume 7972, 797218 (2011) https://doi.org/10.1117/12.884519

KEYWORDS: Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Electron beam lithography, Lithography, Spectroscopy, Line edge roughness, Image resolution, Glasses, Atomic force microscopy

Read Abstract +

Proceedings Article | 16 April 2011 Paper

Paper

Hexafluoroalcohol (HFA) containing molecular resist materials for high-resolution lithographic applications

Anuja De Silva, Linda Sundberg, Ratnam Sooriyakumaran, Luisa Bozano, Greg Breyta, William Hinsberg, Masaki Fujiwara

Proceedings Volume 7972, 79721Z (2011) https://doi.org/10.1117/12.881735

KEYWORDS: Magnesium, Lithography, Glasses, Silicon, Extreme ultraviolet lithography, Electron beam lithography, Molecules, Extreme ultraviolet, Polymers, Thin films

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Paper

Hybrid resist systems based on α-substituted acrylate copolymers

Hiroshi Ito, Linda Sundberg, Luisa Bozano, Elizabeth Lofano, Kazuhiro Yamanaka, Yoshiharu Terui, Masaki Fujiwara

Proceedings Volume 7273, 72733H (2009) https://doi.org/10.1117/12.813352

KEYWORDS: Polymers, Polymethylmethacrylate, Line width roughness, Line edge roughness, Polymerization, Crystals, Semiconducting wafers, Quartz, Silicon, Manufacturing

Read Abstract +

Classical electron-beam resists such as poly(methyl methacrylate) (PMMA) and Nippon Zeon's ZEP function as high resolution and low roughness positive resists on the basis of radiation induced main chain scission to reduce the molecular weight while chemical amplification resists utilized in device manufacturing function on the basis of acidcatalyzed deprotection to change the polarity. In an attempt to increase the resolution and reduce the line roughness of chemical amplification resists, we prepared copolymers that undergo radiation induced main chain scission and acidcatalyzed deprotection. In another word, we wanted to increase the sensitivity of the PMMA resist by incorporating the acid-catalyzed deprotection mechanism in polymers that undergo main chain scission, maintaining the high resolution and low roughness of PMMA. To synthesize such hybrid resist polymers, we selected α-substituted acrylates and α- substituted styrenes. The former included methyl methacrylate (MMA), t-butyl methacrylate (TBMA), methyl α- fluoroacrylate (MFA), t-butyl α-fluoroacrylate (TBFA), and t-butyl α-trifluoromethylacrylate (TBTFMA) and the latter α-methylstyrene (αMEST), α-methyleneindane (αMEIN), and α-methylenetetralin (αMETL). The α-substituted tbutyl acrylic esters were copolymerized with the methyl esters and also with α-substituted styrenic monomers using 2, 2'-azobis(isobutyronitrile) (AIBN). Hybrid resists were formulated by adding a photochemical acid generator and a base quencher to the copolymers and developers were selected by studying the dissolution behavior of unexposed and 254 nm exposed resist films using a quartz crystal microbalance (QCM). In addition to the difference in the imaging mechanism, PMMA and ZEP differ from the chemical amplification resists in developers; organic solvent vs. aqueous base. We were interested in looking also into the influence of the developer on the lithographic performance. Contrast curves were generated by exposing the resist films to 100 keV electron beams and by changing the postexposure bake temperature (PEB) on a thermal gradient hot plate (TGP). The resists were imaged on our Leica 100 keV electron-beam system and line roughness was measured.

Proceedings Article | 15 April 2008 Paper

Paper

A new class of low bake resists for 193-nm immersion lithography

Ratnam Sooriyakumaran, Richard DiPietro, Hoa Truong, Phillip Brock, Robert Allen, Luisa Bozano, Irene Popova, Wu-Song Huang, Rex Chen, Mahmoud Khojasteh, Pushkara Rao Varanasi

Proceedings Volume 6923, 69230C (2008) https://doi.org/10.1117/12.772947

KEYWORDS: Polymers, Immersion lithography, Diffusion, Image processing, 193nm lithography, Lithography, Chemically amplified resists, Humidity, Photoresist processing, Standards development

Read Abstract +

Proceedings Article | 16 December 1998 Paper

Paper

Injection, transport, and recombination in organic light-emitting diodes

J. Campbell Scott, George Malliaras, Jesse Salem, Phillip Brock, L. Bozano, Sue Carter

Proceedings Volume 3476, (1998) https://doi.org/10.1117/12.332604

KEYWORDS: Electrons, Electrodes, Organic light emitting diodes, Diodes, Quantum efficiency, Polymers, Interfaces, Excitons, Diffusion, Numerical simulations

Read Abstract +

Showing 5 of 18 publications

Conference Committee Involvement (11)

Advances in Patterning Materials and Processes XLII

24 February 2025 | San Jose, California, United States

Advances in Patterning Materials and Processes XLI

26 February 2024 | San Jose, California, United States

Advances in Patterning Materials and Processes XL

27 February 2023 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXIII

29 February 2016 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXII

24 February 2015 | San Jose, California, United States

Showing 5 of 11 Conference Committees

SIGN IN TO:

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Advertisement

Advertisement