A fully automated multi-target reactive magnetron sputtering (MS) process is presented in which real-time modeling and in situ standard or Mueller matrix ellipsometry is combined demonstrating growth of nanoscale multi-layer optical thin films having desired properties such as thickness, while observing properties such as index of refraction (n), extinction coefficient (k), and complex permittivity throughout growth. For each material layer isotropic or anisotropic properties as required can be modeled automatically in real-time, allowing for the development of hyperbolic metamaterials. In situ use of an RC2 ellipsometer from JA Woollam is presented, having a spectral range of 210nm - 2500nm. TEM measurements of the thin films are presented.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.