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Manish Jaideo Patil
at Photronics Inc
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Author
Publications (5)
Proceedings Article | 24 March 2009 Paper
Haze generation model and prevention techniques for sulfate free cleaned mask
Manish Patil, Jong-Min Kim, Ik-Boum Hur, Sang-Soo Choi
Proceedings Volume 7272, 72721X (2009) https://doi.org/10.1117/12.816350
KEYWORDS: Air contamination, Chromium, Photomasks, Pellicles, Ions, Surface properties, Semiconducting wafers, Thermodynamics, Adsorption, Molecules
Proceedings Article | 19 May 2008 Paper
Post cleaned surface modification treatment to prevent near pellicle haze generation in sulfate free cleaned ArF EAPSM
Manish Patil, Jong-Min Kim, Sung-Mo Jung, Ik-Boum Hur, Sang-Soo Choi, Yong Hyun Lee
Proceedings Volume 7028, 70282C (2008) https://doi.org/10.1117/12.793086
KEYWORDS: Air contamination, Pellicles, Photomasks, Ions, Chromium, Quartz, Deep ultraviolet, Semiconducting wafers, Transmittance, Surface properties
Proceedings Article | 19 May 2008 Paper
Patterning capability and limitations by pattern collapse in 45nm and below node photo mask production
Guen-Ho Hwang, Manish Patil, Soon-Kyu Seo, Chu-Bong Yu, Ik-Boum Hur, Dong Hyun Kim, Cheol Shin, Sung-Mo Jung, Yong-Hyun Lee, Sang-Soo Choi
Proceedings Volume 7028, 702824 (2008) https://doi.org/10.1117/12.793081
KEYWORDS: Etching, Photomasks, SRAF, Optical lithography, Dry etching, Photoresist processing, Photoresist materials, Capillaries, Lithography, Manufacturing
Proceedings Article | 1 November 2007 Paper
A study of haze generation as thin film materials
Ju-Hyun Kang, Han-Sun Cha, Sin-Ju Yang, Chul-Kyu Yang, Jin-Ho Ahn, Kee-Soo Nam, Jong-Min Kim, Manish Patil, Ik-Bum Hur, Sang-Soo Choi
Proceedings Volume 6730, 67304K (2007) https://doi.org/10.1117/12.746684
KEYWORDS: Air contamination, Ions, Nitrogen, Metals, Thin films, Photomasks, Chemical analysis, Inspection, Scanning probe microscopy, Quartz
Proceedings Article | 1 November 2007 Paper
Haze generation effect by pellicle and packing box on photomask
Jong-Min Kim, Manish Patil, Woo-Gun Jeong, Ik-Boum Hur, Cheol Shin, Sung-Mo Jung, Moon-Hwan Choi, Sang-Soo Choi
Proceedings Volume 6730, 67304O (2007) https://doi.org/10.1117/12.747121
KEYWORDS: Photomasks, Air contamination, Pellicles, Ions, Contamination, Adhesives, Fluorine, Raman spectroscopy, Glasses, Inspection
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