Mr. Manuel Theisen Profile

Manuel Theisen

at Bergische Univ Wuppertal

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Proceedings Article | 3 October 2024 Presentation

Atomic layer deposition as an enabling technology for perovskite solar cells

Thomas Riedl, Kai Brinkmann, Cedric Kreusel, Manuel Theisen, Florian Zimmermann, Christian Tückmantel

Proceedings Volume PC13114, PC131140F (2024) https://doi.org/10.1117/12.3028565

KEYWORDS: Solar cells, Perovskite, Atomic layer deposition

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Metal halide perovskite solar cells have achieved efficiencies exceeding 26%, at par with crystalline Silicon. However, concerns of long-term stability and open questions about upscaled manufacturing persist. I will show how atomic layer deposition (ALD) can unlock further progress towards increased efficiency and long-term stability. Permeation barriers prepared by ALD as integral part of the device architecture suppress thermally driven decomposition of the perovskite and inhibit detrimental diffusion of halide species [1]. At the same time, ALD enables novel processing options for the preparation of semitransparent cells [2] and ultra-thin loss-less interconnects for tandem architectures [3] with the prospects to reach efficiency levels beyond 30% [4]. As ALD is originally a vacuum-based batch-processing technique, I will address the prospects of upscaling ALD for high-throughput manufacturing by the introduction of spatial ALD (S-ALD). [1] K. O. Brinkmann et al., Nat. Comms. 2017, 8, 13938. [2] T. Gahlmann et al., Adv. Energy Mater. 10, 1903. [3] K. O. Brinkmann et al., Nature 604, 280 (2022). [4] K.O. Brinkmann et al. Nat. Rev. Mater. DOI: 10.1038/s41578-023-00642-1.

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