Prof. Marco Stampanoni
Head of X-ray Tomography Group at ETH Zurich
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 4 October 2024 Presentation
Jisoo Kim, Stefan Gstöhl, Robert Auenhammer, Matias Kagias, Federica Marone, Marco Stampanoni
Proceedings Volume 13152, 131520H (2024) https://doi.org/10.1117/12.3026865
KEYWORDS: Scattering, X-rays, Tomography, Materials properties, Composites, Carbon fibers, Finite element methods, Simulations, Microfluidics, Engineering

Proceedings Article | 18 October 2022 Open Access Paper
Stefano van Gogh, Subhadip Mukherjee, Michał Rawlik, Zhentian Wang, Jinqiu Xu, Zsuzsanna Varga, Carola-Bibiane Schönlieb, Marco Stampanoni
Proceedings Volume 12304, 1230417 (2022) https://doi.org/10.1117/12.2646437
KEYWORDS: Reconstruction algorithms, Denoising, X-rays, Interferometry, Breast, X-ray computed tomography, Neural networks, Visibility, Refraction, Phase interferometry

Proceedings Article | 9 September 2019 Paper
Klaus Wakonig, Ana Diaz, Sabina Chiriotti, Anna Bergamaschi, Anne Bonnin, Marco Stampanoni, Andreas Menzel
Proceedings Volume 11112, 111120I (2019) https://doi.org/10.1117/12.2528905
KEYWORDS: X-rays, Objectives, X-ray imaging, Sensors, Microscopes, Zone plates, Image resolution, Image quality, Hard x-rays, Phase contrast, Alignment procedures, Quantitative analysis, Detector development

Proceedings Article | 2 May 2017 Presentation
Carolina Arboleda Clavijo, Zhentian Wang, Thomas Köhler, Udo van Stevendaal, Gerhard Martens, Matthias Bartels, Pablo Villanueva-Perez, Ewald Roessl, Marco Stampanoni
Proceedings Volume 10132, 1013218 (2017) https://doi.org/10.1117/12.2253875
KEYWORDS: Prototyping, Mammography, Phase contrast, Breast, Tissues, Interferometers, Signal to noise ratio, Visibility, Data modeling, Optical design

Proceedings Article | 27 March 2017 Paper
Konstantins Jefimovs, Lucia Romano, Joan Vila-Comamala, Matias Kagias, Zhentian Wang, Li Wang, Christian Dais, Harun Solak, Marco Stampanoni
Proceedings Volume 10146, 101460L (2017) https://doi.org/10.1117/12.2258007
KEYWORDS: Lithography, Semiconducting wafers, Photomasks, Lithographic illumination, Reactive ion etching, Silicon, Phase contrast, X-ray imaging, Etching, Optical lithography, X-rays, Photoresist materials, Chromium

Showing 5 of 30 publications
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