Mr. Mark Notarfrancesco Profile

Mark Notarfrancesco

Process Engineer at Intel Corp

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 26 July 1999 Paper

Optimization of a mix-and-match fab: noninteger nonconcentric field overlay

Mark Notarfrancesco, Paul Herrington, Joseph Pelligrini

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354321

KEYWORDS: Semiconducting wafers, Optical alignment, Reticles, Manufacturing, Overlay metrology, Algorithm development, Data modeling, Statistical modeling, Process modeling, Distortion

Read Abstract +

Existing techniques have been characterized to align a given Nikon Body 7 exposure field to a larger Nikon Body 9 exposure field where the underlying Body 9 printed field area can be a non-integer multiple of the Body 7 printed field area. The enhancement of these techniques has been centered mostly upon the sampling plans of the Nikon alignment algorithms and the registration measurement sampling plans. Software provided by New Vision Systems has provided a cursory look into the performance of the technique used. This non-concentric phenomenon has been explored in several recent technical papers. Most previous works limited their analysis to integer non-concentric matching. Our study discusses a real manufacturing situation in a mature fab using the more flexible and economical technique of fractional field matching. On one particular device with not all the layers being interchangeable between Body 7 and Body 9 models, the non-concentric process decreased the number of exposure fields by 17.9 percent over the concentric process at the cost of additional overlay error. This additional error is not yet fully characterized, however can be between a 25-100 percent increase over the concentric process.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years