Mr. Mark Terry Profile

Mark Terry

Team Leader/Photo Unit Process at Texas Instruments Inc

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Author

Publications (11)

Proceedings Article | 13 March 2009 Paper

Variations in timing and leakage power of 45nm library cells due to lithography and stress effects

Kayvan Sadra, Mark Terry, Arjun Rajagopal, Robert Soper, Donald Kolarik, Tom Aton, Brian Hornung, Rajesh Khamankar, Philippe Hurat, Bala Kasthuri, Yajun Ran, Nishath Verghese

Proceedings Volume 7275, 72750K (2009) https://doi.org/10.1117/12.816485

KEYWORDS: Transistors, Lithography, Computer simulations, Statistical analysis, Logic, Data modeling, Capacitors, Optical proximity correction, Convolution, Design for manufacturing

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Proceedings Article | 19 March 2008 Paper

Context analysis and validation of lithography induced systematic variations in 65nm designs

Arjun Rajagopal, Anand Rajaram, Raguram Damodaran, Frank Cano, Srinivas Swaminathan, Clive Bittlestone, Mark Terry, Mark Mason, Yajun Ran, Haizhou Chen, Robert Ritchie, Bala Kasthuri, Jac Condella, Philippe Hurat, Nishath Verghese

Proceedings Volume 6925, 69250A (2008) https://doi.org/10.1117/12.778836

KEYWORDS: Silicon, Model-based design, Data modeling, Etching, Scanning electron microscopy, Transistors, Optical proximity correction, Lithography, Critical dimension metrology, Process modeling

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Proceedings Article | 27 March 2007 Paper

Process window and interlayer aware OPC for the 32-nm node

Mark Terry, Gary Zhang, George Lu, Simon Chang, Tom Aton, Robert Soper, Mark Mason, Shane Best, Bill Dostalik, Stefan Hunsche, Jiang Wei Li, Rongchun Zhou, Mu Feng, Jim Burdorf

Proceedings Volume 6520, 65200S (2007) https://doi.org/10.1117/12.714442

KEYWORDS: Optical proximity correction, Metals, Photomasks, Model-based design, SRAF, Tolerancing, Critical dimension metrology, Lithography, Data modeling, Performance modeling

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Proceedings Article | 20 October 2006 Paper

Finding the needle in the haystack: using full-chip process window analysis to qualify competing SRAF placement strategies for 65 nm

Mark Mason, Shane Best, Gary Zhang, Mark Terry, Robert Soper

Proceedings Volume 6349, 63491X (2006) https://doi.org/10.1117/12.687008

KEYWORDS: SRAF, Optical proximity correction, Resolution enhancement technologies, Optical lithography, Model-based design, Silicon, Lithography, Photomasks, Semiconducting wafers, Picosecond phenomena

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Proceedings Article | 17 March 2006 Paper

Improving asymmetric printing and low margin using custom illumination for contact hole lithography

Scott Jessen, Mark Terry, Mark Mason, Sean O'Brien, Robert Soper, Willie Yarbrough, Thomas Wolf

Proceedings Volume 6156, 615616 (2006) https://doi.org/10.1117/12.660120

KEYWORDS: SRAF, Printing, Optical proximity correction, Lithographic illumination, Fiber optic illuminators, Lithography, Logic devices, Photomasks, Metals, Logic

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Proceedings Article | 14 March 2006 Paper

Challenges and solutions for trench lithography beyond 65nm node

Zhijian Lu, Chi-Chien Ho, Mark Mason, Andrew Anderson, Randy Mckee, Ricky Jackson, Cynthia Zhu, Mark Terry

Proceedings Volume 6156, 615617 (2006) https://doi.org/10.1117/12.659242

KEYWORDS: Optical proximity correction, Metals, Model-based design, Design for manufacturing, Lithography, Process modeling, Reticles, Semiconducting wafers, Resolution enhancement technologies, Optimization (mathematics)

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Proceedings Article | 12 May 2005 Paper

65nm node gate pattern using attenuated phase shift mask with off-axis illumination and sub-resolution assist features

Gary Zhang, Mark Terry, Sean O'Brien, Robert Soper, Mark Mason, Won Kim, Changan Wang, Steven Hansen, Jason Lee, Joe Ganeshan

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600409

KEYWORDS: SRAF, Critical dimension metrology, Optical proximity correction, Photomasks, Scanners, Lithographic illumination, Semiconducting wafers, Phase shifts, Lithography, Resolution enhancement technologies

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Proceedings Article | 5 May 2005 Paper

Design rule considerations for 65-nm node contact using off axis illumination

Scott Jessen, Mark Mason, Sean O'Brien, Mark Terry, Robert Soper, Thomas Wolf

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.600005

KEYWORDS: SRAF, Printing, Photomasks, Optical proximity correction, Manufacturing, Lithography, Solids, Logic, Image resolution, Model-based design

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Proceedings Article | 14 September 2001 Paper

Behavior of lens aberrations as a function of wavelength on KrF and ArF lithography scanners

Mark Terry, Ivan Lalovic, Gregory Wells, Adlai Smith

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435740

KEYWORDS: Scanners, Lithography, Wavefronts, Distortion, Error analysis, Laser scanners, 3D scanning, Interferometers, Colorimetry, Monochromatic aberrations

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Proceedings Article | 5 July 2000 Paper

Gauging the performance of an in-situ interferometer

Mark Terry, Adlai Smith, Ken Rebitz

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388960

KEYWORDS: Monochromatic aberrations, Interferometers, Wavefronts, Lithography, Semiconducting wafers, Scanning electron microscopy, Zernike polynomials, Spherical lenses, Photoresist processing, Lithographic illumination

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Proceedings Article | 7 July 1997 Paper

Process-specific tuning of lithography simulation tools

Mark Mason, Robert Soper, R. Mark Terry, Chris Mack

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275981

KEYWORDS: Lithography, Process modeling, Photoresist processing, Optimization (mathematics)

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Showing 5 of 11 publications

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