Dr. Markus Brink Profile

Dr. Markus Brink

at IBM Thomas J Watson Research Ctr

SPIE Involvement:

Author

Publications (5)

SPIE Journal Paper | 7 February 2017

Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?

Kafai Lai, Chi-Chun Liu, Hsinyu Tsai, Yongan Xu, Cheng Chi, Ananthan Raghunathan, Parul Dhagat, Lin Hu, Oseo Park, Sunggon Jung, Wooyong Cho, Jaime Morillo, Jed Pitera, Kristin Schmidt, Mike Guillorn, Markus Brink, Daniel Sanders, Nelson Felix, Todd Bailey, Matthew Colburn

JM3, Vol. 16, Issue 01, 013502, (February 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.1.013502

KEYWORDS: Directed self assembly, Resolution enhancement technologies, Lithography, Metals, Optical lithography, Photomasks, 3D modeling, Computational lithography, Optical proximity correction

Read Abstract +

Proceedings Article | 19 March 2015 Paper

Customization and design of directed self-assembly using hybrid prepatterns

Joy Cheng, Gregory Doerk, Charles Rettner, Gurpreet Singh, Melia Tjio, Hoa Truong, Noel Arellano, Srinivasan Balakrishnan, Markus Brink, Hsinyu Tsai, Chi-Chun Liu, Michael Guillorn, Daniel Sanders

Proceedings Volume 9423, 942307 (2015) https://doi.org/10.1117/12.2086973

KEYWORDS: Picosecond phenomena, Polymethylmethacrylate, System on a chip, Scanning electron microscopy, Image segmentation, Photomasks, Etching, Electron beam lithography, Composites, Directed self assembly

Read Abstract +

Proceedings Article | 19 March 2015 Paper

Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch

HsinYu Tsai, Hiroyuki Miyazoe, Joy Cheng, Markus Brink, Simon Dawes, David Klaus, James Bucchignano, Daniel Sanders, Eric Joseph, Matthew Colburn, Michael Guillorn

Proceedings Volume 9423, 942314 (2015) https://doi.org/10.1117/12.2084845

KEYWORDS: Etching, Silicon, Photomasks, Line edge roughness, Polymethylmethacrylate, Tolerancing, Polymers, Optical lithography, Directed self assembly

Read Abstract +

Proceedings Article | 17 March 2012 Paper

Patterning of CMOS device structures for 40-80nm pitches and beyond

S. Engelmann, R. Martin, R. Bruce, H. Miyazoe, N. C. Fuller, W. Graham, E. Sikorski, M. Glodde, M. Brink, H. Tsai, J. Bucchignano, D. Klaus, E. Kratschmer, M. Guillorn

Proceedings Volume 8328, 83280B (2012) https://doi.org/10.1117/12.916447

KEYWORDS: Etching, Optical lithography, Plasma, Line edge roughness, Polymers, Silicon, Polymethylmethacrylate, Oxides, Vacuum ultraviolet, Lithography

Read Abstract +

Proceedings Article | 16 April 2011 Paper

Systematic studies on reactive ion etch-induced deformations of organic underlayers

Martin Glodde, Sebastian Engelmann, Michael Guillorn, Sivananda Kanakasabapathy, Erin Mclellan, Chiew-Seng Koay, Yunpeng Yin, Muthumanickam Sankarapandian, John Arnold, Karen Petrillo, Markus Brink, Hiroyuki Miyazoe, E. Anuja de Silva, Hakeem Yusuff, Kwang-sub Yoon, Yayi Wei, Chung-hsi Wu, P. Rao Varanasi

Proceedings Volume 7972, 797216 (2011) https://doi.org/10.1117/12.879442

KEYWORDS: Reactive ion etching, Etching, Ions, Plasma, Hydrogen, Gases, Plasma etching, Silicon, Oxides, Electron beam lithography

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years