Dr. Martin Lowisch
Deceased at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 17 April 2014 Paper
Rudy Peeters, Sjoerd Lok, Joerg Mallman, Martijn van Noordenburg, Noreen Harned, Peter Kuerz, Martin Lowisch, Eelco van Setten, Guido Schiffelers, Alberto Pirati, Judon Stoeldraijer, David Brandt, Nigel Farrar, Igor Fomenkov, Herman Boom, Hans Meiling, Ron Kool
Proceedings Volume 9048, 90481J (2014) https://doi.org/10.1117/12.2046909
KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Extreme ultraviolet, Logic, Imaging systems, Scanners, Optical proximity correction, Metrology, Photomasks

Proceedings Article | 1 April 2013 Paper
Martin Lowisch, Peter Kuerz, Olaf Conradi, Gero Wittich, Wolfgang Seitz, Winfried Kaiser
Proceedings Volume 8679, 86791H (2013) https://doi.org/10.1117/12.2012158
KEYWORDS: Mirrors, EUV optics, Extreme ultraviolet, Optics manufacturing, Extreme ultraviolet lithography, Coating, Ions, Eye, Reflectivity, Neodymium

Proceedings Article | 1 April 2013 Paper
Rudy Peeters, Sjoerd Lok, Erwin van Alphen, Noreen Harned, Peter Kuerz, Martin Lowisch, Henk Meijer, David Ockwell, Eelco van Setten, Guido Schiffelers, Jan-Willem van der Horst, Judon Stoeldraijer, Robert Kazinczi, Richard Droste, Hans Meiling, Ron Kool
Proceedings Volume 8679, 86791F (2013) https://doi.org/10.1117/12.2010932
KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Scanners, Extreme ultraviolet, Overlay metrology, Image resolution, Mirrors, Lithography, Wafer-level optics

Proceedings Article | 23 March 2012 Paper
Hans Meiling, Wim de Boeij, Frank Bornebroek, Noreen Harned, Ivo de Jong, Peter Kűrz, Martin Lowisch, Henk Meijer, David Ockwell, Rudy Peeters, Eelco van Setten, Judon Stoeldraijer, Christian Wagner, Stuart Young, Ron Kool
Proceedings Volume 8322, 83221G (2012) https://doi.org/10.1117/12.916971
KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Extreme ultraviolet, Scanners, Mirrors, Photomasks, Particles, Overlay metrology, Line width roughness

Proceedings Article | 7 April 2011 Paper
Christian Wagner, Jose Bacelar, Noreen Harned, Erik Loopstra, Stef Hendriks, Ivo de Jong, Peter Kuerz, Leon Levasier, Mark van de Kerkhof, Martin Lowisch, Hans Meiling, David Ockwell, Rudy Peeters, Eelco van Setten, Judon Stoeldraijer, Stuart Young, John Zimmerman, Ron Kool
Proceedings Volume 7969, 79691F (2011) https://doi.org/10.1117/12.878603
KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Overlay metrology, Optical proximity correction, Manufacturing, Extreme ultraviolet, Contamination, High volume manufacturing, Optics manufacturing

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 76361H (2010) https://doi.org/10.1117/12.845700
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Reticles, Optics manufacturing, Lithography, System integration, Mirrors, Lithographic illumination, Optical alignment

Proceedings Article | 18 March 2010 Paper
Martin Lowisch, Peter Kuerz, Hans-Juergen Mann, Oliver Natt, Bernd Thuering
Proceedings Volume 7636, 763603 (2010) https://doi.org/10.1117/12.848624
KEYWORDS: Mirrors, Extreme ultraviolet, Projection systems, EUV optics, Optics manufacturing, Extreme ultraviolet lithography, Reticles, Coating, Wavefronts, Reflectivity

Proceedings Article | 10 December 2009 Paper
Hans Meiling, Nico Buzing, Kevin Cummings, Noreen Harned, Bas Hultermans, Roel De Jonge, Bart Kessels, Peter Kürz, Sjoerd Lok, Martin Lowisch, Joerg Mallman, Bill Pierson, Christian Wagner, Andre Van Dijk, Eelco Van Setten, John Zimmerman, Peter Cheang, Alek Chen
Proceedings Volume 7520, 752008 (2009) https://doi.org/10.1117/12.845781
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Reticles, Reflectivity, Semiconducting wafers, Optics manufacturing, Lithography, Plasma, Tin

SPIE Journal Paper | 1 October 2009
JM3, Vol. 8, Issue 04, 041509, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238543
KEYWORDS: EUV optics, Extreme ultraviolet, Stray light, Critical dimension metrology, Nanoimprint lithography, Fiber optic illuminators, Photomasks, Optics manufacturing, Printing, Optical proximity correction

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72711B (2009) https://doi.org/10.1117/12.814185
KEYWORDS: Extreme ultraviolet, EUV optics, Nanoimprint lithography, Fiber optic illuminators, Critical dimension metrology, Optics manufacturing, Lithography, Optical proximity correction, Image processing, Solids

Proceedings Article | 18 March 2009 Open Access Paper
Hans Meiling, Nico Buzing, Kevin Cummings, Noreen Harned, Bas Hultermans, Roel de Jonge, Bart Kessels, Peter Kürz, Sjoerd Lok, Martin Lowisch, Joerg Mallman, Bill Pierson, Christian Wagner, Andre van Dijk, Eelco van Setten, John Zimmerman
Proceedings Volume 7271, 727102 (2009) https://doi.org/10.1117/12.814041
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Semiconducting wafers, Mirrors, Reticles, Tin, Reflectivity, Plasma, Lithography

Proceedings Article | 21 March 2008 Paper
Hans Meiling, Edwin Boon, Nico Buzing, Kevin Cummings, Olav Frijns, Judy Galloway, Mieke Goethals, Noreen Harned, Bas Hultermans, Roel de Jonge, Bart Kessels, Peter Kürz, Sjoerd Lok, Martin Lowisch, Joerg Mallman, Bill Pierson, Kurt Ronse, James Ryan, Emil Smitt-Weaver, Michael Tittnich, Christian Wagner, Andre van Dijk, John Zimmerman
Proceedings Volume 6921, 69210L (2008) https://doi.org/10.1117/12.773259
KEYWORDS: Extreme ultraviolet, Tin, Extreme ultraviolet lithography, Semiconducting wafers, Mirrors, Printing, Sensors, Stray light, Cameras, Reticles

Proceedings Article | 13 March 2007 Paper
Noreen Harned, Mieke Goethals, Rogier Groeneveld, Peter Kuerz, Martin Lowisch, Henk Meijer, Hans Meiling, Kurt Ronse, James Ryan, Michael Tittnich, Harm-Jan Voorma, John Zimmerman, Uwe Mickan, Sjoerd Lok
Proceedings Volume 6517, 651706 (2007) https://doi.org/10.1117/12.712065
KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Mirrors, Photomasks, Reflectivity, Tin, Reliability

Proceedings Article | 20 May 2004 Paper
Martin Lowisch, Udo Dinger, Uwe Mickan, Tilmann Heil
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537338
KEYWORDS: Extreme ultraviolet lithography, Mirrors, Electroluminescence, Reticles, Nanoimprint lithography, Lithography, Diffraction, Critical dimension metrology, Photomasks, Imaging systems

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.482694
KEYWORDS: Monochromatic aberrations, Critical dimension metrology, Lithography, Wavefronts, Lawrencium, Spherical lenses, Wavefront aberrations, Zernike polynomials, Systems modeling, 193nm lithography

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474569
KEYWORDS: Photomasks, Printing, Nanoimprint lithography, Image processing, Lithography, Image filtering, Reticles, Binary data, Monochromatic aberrations, Electroluminescence

Proceedings Article | 6 June 1997 Paper
Martin Lowisch, Michael Rabe, B. Stegemann, Fritz Henneberger
Proceedings Volume 2994, (1997) https://doi.org/10.1117/12.275576
KEYWORDS: Quantum dots, Excitons, Phonons, Luminescence, Cadmium, Molecular self-assembly, Quantum wells, Transmission electron microscopy, Molecular beam epitaxy, Semiconductors

Proceedings Article | 1 May 1996 Paper
Fritz Henneberger, Joachim Puls, T. Hauepl, Frank Kreller, Martin Lowisch, H. Nickolaus, Alex Schuelzgen, Hans-Juergen Wuensche, J. Griesche, Nir Hoffman, Michael Rabe
Proceedings Volume 2693, (1996) https://doi.org/10.1117/12.238957
KEYWORDS: Excitons, Quantum wells, Picosecond phenomena, Absorption, Cadmium, Temperature metrology, Scattering, Geometrical optics, Semiconductor lasers, Plasma

Showing 5 of 18 publications
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