CONFERENCE PROCEEDINGS
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Dr. Maryann C. Tung
R&D Engineer
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Author
Publications (5)
Proceedings Article | 25 May 2022 Presentation + Paper
Nanoscale phase change memory arrays patterned by block copolymer directed self-assembly
Maryann Tung, Asir Intisar Khan, Heungdong Kwon, Mehdi Asheghi, Kenneth Goodson, Eric Pop, H.-S. Philip Wong
Proceedings Volume 12054, 1205406 (2022) https://doi.org/10.1117/12.2611737
KEYWORDS: Directed self assembly, Amorphous silicon, Tin, Etching, Switching, Resistance, Scanning electron microscopy, Electrodes, Plasma, Sputter deposition
Proceedings Article | 28 March 2017 Presentation + Paper
Density driven placement of sub-DSA resolution assistant features (SDRAFs)
Daifeng Guo, Maryann Tung, Ioannis Karageorgos, H.-S. Philip Wong, Martin D. Wong
Proceedings Volume 10148, 101480E (2017) https://doi.org/10.1117/12.2257954
KEYWORDS: Directed self assembly, Algorithms, Electron beam lithography, Extreme ultraviolet lithography, Lithography, Mirrors, Semiconducting wafers, Polymers, Optical lithography, Manufacturing
SPIE Journal Paper | 7 November 2016
Design method and algorithms for directed self-assembly aware via layout decomposition in sub-7 nm circuits
Ioannis Karageorgos, Julien Ryckaert, Roel Gronheid, Maryann Tung, H.-S. Philip Wong, Evangelos Karageorgos, Kris Croes, Joost Bekaert, Geert Vandenberghe, Michele Stucchi, Wim Dehaene
JM3, Vol. 15, Issue 04, 043506, (November 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.043506
KEYWORDS: Directed self assembly, Optical lithography, Metals, Photomasks, Lithography, Algorithm development, Immersion lithography, Molecular self-assembly, Electronic design automation, Extreme ultraviolet
Proceedings Article | 16 March 2016 Paper
Design strategy for integrating DSA via patterning in sub-7 nm interconnects
Ioannis Karageorgos, Julien Ryckaert, Maryann Tung, H.-S. Wong, Roel Gronheid, Joost Bekaert, Evangelos Karageorgos, Kris Croes, Geert Vandenberghe, Michele Stucchi, Wim Dehaene
Proceedings Volume 9781, 97810N (2016) https://doi.org/10.1117/12.2222041
KEYWORDS: Directed self assembly, Optical lithography, Computer aided design, Photomasks, Extreme ultraviolet, Lithography, Design for manufacturability, Manufacturing, Immersion lithography, Double patterning technology, Algorithm development, Polymethylmethacrylate
Proceedings Article | 19 March 2015 Paper
Cross-sectional imaging of directed self-assembly block copolymers
Kye Okabe, He Yi, Maryann Tung, Richard Tiberio, Joost Bekaert, Roel Gronheid, H.-S. Wong
Proceedings Volume 9423, 942318 (2015) https://doi.org/10.1117/12.2087569
KEYWORDS: Transmission electron microscopy, Platinum, Interfaces, Silicon, Polymethylmethacrylate, 3D modeling, System on a chip, Scanning electron microscopy, Etching, Directed self assembly
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