Mr. Masahiro Shoji Profile

Masahiro Shoji

Sales Representative at Nippon Control System Corp

SPIE Involvement:

Author

Publications (21)

Proceedings Article | 25 September 2010 Paper

Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction

Masaki Yamabe, Tadao Inoue, Masahiro Shoji, Akio Yamada, Hiromichi Hoshi, Kenichi Takahara

Proceedings Volume 7823, 78230S (2010) https://doi.org/10.1117/12.864196

KEYWORDS: Photomasks, Inspection, Logic, Manufacturing, Vestigial sideband modulation, Image transmission, System integration, Extreme ultraviolet, Diagnostics, Parallel processing

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Proceedings Article | 25 September 2010 Paper

Proximity effect correction concerning forward scattering

Dai Tsunoda, Masahiro Shoji, Hiroyuki Tsunoe

Proceedings Volume 7823, 78233D (2010) https://doi.org/10.1117/12.864189

KEYWORDS: Scattering, Laser scattering, Photomasks, Chemical species, Lithography, Molecules, Convolution, Modulation, Parallel processing, Critical dimension metrology

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Proceedings Article | 25 May 2010 Paper

Extraction and utilization of the repeating patterns for CP writing in mask making

Masahiro Shoji, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7748, 77480Y (2010) https://doi.org/10.1117/12.864285

KEYWORDS: Vestigial sideband modulation, Software development, Data conversion, Optical proximity correction, Photomasks, Mask making, Analytical research, Inspection, Logic, Scanning electron microscopy

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Proceedings Article | 3 April 2010 Paper

Practical use of the repeating patterns in mask writing

Masahiro Shoji, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7641, 764112 (2010) https://doi.org/10.1117/12.846019

KEYWORDS: Vestigial sideband modulation, Data conversion, Software development, Optical proximity correction, Photomasks, Inspection, Analytical research, Electronics, Manufacturing, Data processing

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Proceedings Article | 2 April 2010 Paper

Proximity effects correction for sub-10nm patterning node

Piotr Jedrasik, Dai Tsunoda, Masahiro Shoji, Hiroyuki Tsunoe

Proceedings Volume 7638, 76383B (2010) https://doi.org/10.1117/12.848337

KEYWORDS: Electron beam lithography, Scattering, Laser scattering, Electron beams, Calibration, Semiconducting wafers, Analytical research, Photoresist processing, Hydrogen, Critical dimension metrology

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Proceedings Article | 23 September 2009 Paper

Reducing the shot counts of mask writing with OPC by extracting repeating patterns

Masahiro Shoji, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7488, 74882W (2009) https://doi.org/10.1117/12.829247

KEYWORDS: Photomasks, Vestigial sideband modulation, Software development, Optical proximity correction, System on a chip, Inspection, Electronics, Manufacturing, Metals, Electron beams

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Proceedings Article | 18 March 2009 Paper

Proximity effect correction for 20nm dimension patterning

Dai Tsunoda, Masahiro Shoji, Mitsuko Tatsugawa, Hiroyuki Tsunoe, Yusuke Iino, Piotr Jedrasik

Proceedings Volume 7271, 72712S (2009) https://doi.org/10.1117/12.813971

KEYWORDS: Scattering, Lithography, Semiconducting wafers, Electron beam lithography, Point spread functions, Electron beam direct write lithography, Data conversion, Silicon, Molecules, Scanning electron microscopy

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Proceedings Article | 13 March 2009 Paper

Verification of extraction repeating pattern efficiency from many actual device data

Masahiro Shoji, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7275, 72750Q (2009) https://doi.org/10.1117/12.811965

KEYWORDS: Photomasks, System on a chip, Metals, Data conversion, Optical proximity correction, Inspection, Vestigial sideband modulation, Manufacturing, Electronics, Electron beams

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Proceedings Article | 17 October 2008 Paper

Concurrent optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction

Masaki Yamabe, Tadao Inoue, Masahiro Shoji, Hiroshi Yasuda, Hiromichi Hoshi, Masakazu Tokita

Proceedings Volume 7122, 712220 (2008) https://doi.org/10.1117/12.802966

KEYWORDS: Photomasks, Inspection, Manufacturing, Data conversion, Parallel processing, Diagnostics, System integration, Metals, Design for manufacturing, Semiconducting wafers

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Proceedings Article | 19 May 2008 Paper

An extraction of repeating patterns from OPCed layout data

Fujimoto Yoshihiro, Masahiro Shoji, Kokoro Kato, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7028, 702836 (2008) https://doi.org/10.1117/12.793113

KEYWORDS: System on a chip, Optical proximity correction, Data conversion, Inspection, Metals, Manufacturing, Electronics, Vestigial sideband modulation, Parallel processing, Software development

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Proceedings Article | 12 March 2008 Paper

An extraction of repeating patterns from OPCed layout data

Yoshihiro Fujimoto, Masahiro Shoji, Kokoro Kato, Tadao Inoue, Masaki Yamabe

Proceedings Volume 6925, 69250Y (2008) https://doi.org/10.1117/12.771836

KEYWORDS: Optical proximity correction, Data conversion, Inspection, Vestigial sideband modulation, Manufacturing, Electronics, Parallel processing, Software development, Prototyping, Design for manufacturing

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Proceedings Article | 20 May 2006 Paper

New proximity effect correction for under 100 nm patterns

Masahiro Shoji, Nobuyasu Horiuchi, Tomoyuki Chikanaga, Takashi Niinuma, Dai Tsunoda

Proceedings Volume 6283, 62832L (2006) https://doi.org/10.1117/12.681796

KEYWORDS: Scattering, Parallel processing, Modulation, Energy efficiency, Computer simulations, Detection and tracking algorithms, Data modeling, Control systems, Electron beam direct write lithography, Computing systems

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Proceedings Article | 24 March 2006 Paper

New proximity effect correction for under 100nm patterns

Masahiro Shoji, Nobuyasu Horiuchi, Tomoyuki Chikanaga, Takashi Niinuma, Dai Tsunoda

Proceedings Volume 6151, 615128 (2006) https://doi.org/10.1117/12.656079

KEYWORDS: Scattering, Data conversion, Data centers, Computer aided design, Data corrections, Solid modeling, Mirrors, Data compression, Control systems, Electron beam direct write lithography

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Proceedings Article | 28 June 2005 Paper

NGL data conversion system