A potential method for precise and fast dicing of display glass plates is proposed in this study. This technique facilitates
the micromachining of cavities in both front and rear surfaces for a single pass of laser beam. The influences of focusing
depth, input pulse energy, and scanning speed of the laser beam are investigated to study the morphology of the front and
rear surface cavities. A commercial femtosecond laser with pulse duration of 172 fs, center wavelength of 780 nm, and
repetition rate of 1 kHz is used for introducing the cavities.
We have demonstrated femtosecond laser fabrication of submicrometer-sized voids in fused silica. Femtosecond laser pulses of 100 fs were focused into fused silica with a 0.9 numerical aperture (NA) objective lens under various incident conditions. The void shape is linearly drawn in the direction of the laser irradiation, when a single pulse is irradiated. The irradiation of multiple pulses induces multiple spherical voids which make a void array. The void shape also depended on the depth of the focus point beneath the fused silica surface, because the amount of self-focusing has a significant effect on the generation of the voids. The void shape was narrower and longer when the laser pulse was focused into the deeper position (up to 70 μm) in the sample. In addition, a 90 degree bend waveguide was fabricated in combination with a void array reflector. Since both reflector and optical waveguides were fabricated by femtosecond laser only, this technique would be useful to develop 3-dimensional optical devices.
We have demonstrated the nanostructure fabrication on the Si surface by a 150 fs, 800 nm femtosecond laser pulse. The nanohole size of about 100 nm can be formed presumably by a near-field optical enhancement effect induced by the particle illumination. The nanohole size is nearly independent of the irradiated pulse number. It is found that the optical enhancement factor was about 7 in this experiment. The hexagonally arrayed nanoholes were fabricated. The diameter of the fabricated nanohole was about 90 nm and the depth was about 9 nm. In addition, using the double pulse fs laser, we demonstrated a low-loss waveguide fabrication in fused silica. A low-optical-loss waveguide is fabricated under the conditions that the first pulse energy and teh second pulse energy in the double pulse mode are 30 jJ and 160 jJ, respectively, nad the pulse time interval is 3 ps. The weak first pulse would act as a pre-conditioner of the fused silica and then the second subsequent pulse effectively induces the uniform refractive index change. This new femtosecond double pulse fabrication technique will be very promising for low-loss photonic device fabrication for photonic networks.
Permanent refractive index change in bulk glasses induced by femtosecond laser has opened up new ways for photonic devices fabrication. In this technique, temporal profile of femtosecond laser is found to be important because it is a nonlinear material processing. In this paper we investigate temporal profile dependence on the optical waveguides properties written by tightly focused femtosecond laser and loosely focused femtosecond laser. With tight focus writing, optimization of pulse interval of pulse train with a few ps decreased the optical loss of the fabricated waveguides. With loose focus writing, longer femtosecond laser increased the length of the induced refractive index change. 2-D Bragg diffraction gratings were well fabricated using this loose focus method.
We will report on nanostructure fabrication on silicon (Si) substrate by 800 nm femtosecond laser pulses. Spherical alumina particles were placed on the substrate surface. After femtosecond laser irradiation at below-ablation-threshold fluences, we have successfully observed the nanoholes formation with around 100 nm in diameter using scanning electron microscope (SEM) and atomic force microscope (AFM). The dependence of nanohole formation on the laser fluence and laser pulse number was investigated. The mechanism for the nanohole drilling is the near-field optical enhancement effect induced by interaction between local surface plasmon on the particles surface and surface plasmon polariton on the Si substrate surface.
One of the technical issues of waveguide fabrication technique inside transparent materials using femtosecond laser has been an optical loss which may be caused by a nonuniformity of the modified volume. In this paper we report on the optical waveguides fabrication inside fused silica glasses using double pulse femtosecond lasers to solve this issue. We investigate writing conditions of optical waveguides with adjusting pulse intervals and relative fluence of the double pulses. The pulse separation time of the double pulses is varied from 500 fs to 200 ps. The better optical property of the optical waveguides under the conditions that the first pulse energy and the second subsequent pulse energy of the double pulse mode are 30 nJ and 160 nJ, respectively and pulse separation time is 3 ps. This optical loss is smaller than that of the waveguides fabricated using a single pulse femtosecond laser.
We have comparatively studied waveguide fabrication characteristics in various transparent materials by use of temporally shaped femtosecond laser pulses. The materials which we studied here are fused quartz, K-PG375 glass whose melting point is as low as 648 K, and polymethylmethacrylate (PMMA). We have measured amount of refractive index change, writing speed, and laser fluence threshold for waveguide writing in the above mentioned materials. To optimize the optical quality of internal modification of transparent materials by femtosecond laser pulses, we controlled the free electron density induced in the materials by tailoring energy injection as a function of time.
With a loosely focused femtosecond laser, refractive index change is induced in silica glass without any scanning process. By decrease numerical aperture of the incident laser, the induction of irregular structure can be avoided such as clacks and spatial splitting of the induced refractive index change region. We demonstrate controlling of the refractive index change by optimizing the numerical aperture and input energy and input pulsewidth and laser shot number. A new method of fabrication of photonic devices in silica glass is proposed.
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