Mr. Masato Moriya Profile

Masato Moriya

Chief Engineering Manager at Gigaphoton Inc

SPIE Involvement:

Author

Publications (16)

Proceedings Article | 22 February 2021 Presentation

Presentation

Latest ArF light source with speckle reduction technology for immersion lithography improving chip yield

Hirotaka Miyamoto, Takamitsu Komaki, Toshihiro Oga, Taku Yamazaki, Tsukasa Hori, Masato Moriya, Hiroshi Tanaka, Takuya Ishii, Akihiko Kurosu, Katsuhiko Wakana, Takeshi Ohta, Satoru Bushida, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 11613, 116130D (2021) https://doi.org/10.1117/12.2583281

KEYWORDS: Light sources, Speckle, Yield improvement, Extreme ultraviolet lithography, Immersion lithography, Spatial coherence, Temporal coherence, Line width roughness, Optical lithography, Lithography

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Proceedings Article | 23 March 2020 Paper

Paper

Imaging performance enhancement by improvements of spectral performance stability and controllability on the cutting-edge

Miwa Igarashi, Hirotaka Miyamoto, Masahide Katou, Hiroaki Tsushima, Masato Moriya, Akihiko Kurosu, Hiroshi Tanaka, Satoshi Tanaka, Takeshi Ohta, Satoru Bushida, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 11327, 1132717 (2020) https://doi.org/10.1117/12.2551845

KEYWORDS: Diffraction gratings, Prisms, Diffraction, Actuators, Light sources, Control systems, Oscillators, Wavefronts, Beam expanders, Excimer lasers

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Multiple patterning ArF immersion lithography has been expected as the promising technology to meet tighter leading edge device requirements. To enhance the resolution and productivity for multiple-patterning application, key light source performances are spectral bandwidth stability and wavelength stability. The increased spectral bandwidth stability contributes to more precise critical dimension (CD) control and improves device yield. The increased wavelength stability can realize accurate focus and improve overlay accuracy. Our new spectral bandwidth control module improves E95 spectral bandwidth stability. The spectral bandwidth has deviations by thermal history with light source operations. It should be always controlled tightly even after a quiescent interval, such as wafer loading. In our laser system, a spectral bandwidth is controlled by adjusting the wavefront of a laser beam using a two-lens optical system within a resonator. A high speed actuator equipped the movable lens enables E95 spectral bandwidth stability to be less variation. New designs of drive mechanism suppress the lens vibration and spectral bandwidth error. This technology enables 3-sigma of E95 spectral bandwidth field average to be under 5 fm. This large shrinkage for E95 spectral bandwidth stability is the key to improve larger focus budgets for a leading edge processes. A new designed line narrowing module (LNM) improves wavelength stability. The wavelength is controlled by changing the rotation of a beam expander prism using actuator. Wavelength stability is improved further by the anti-vibration structure of the actuated prism in the LNM. The new design prism holding mechanisms reduce the mass of actuator load. This increases the stiffness of the system and suppresses the vibration of the prism rotation. New LNM reduce wavelength stability about 20%. The improvement in wavelength stability contributes to accurate focus and overlay. In addition, the lifetime of LNM is extending to reduce the Cost of Operation (CoO) and the light source downtime. A new ArF excimer laser, GT66A, maximizes device yield, process productivity and minimizes the operational costs for chipmakers.

Proceedings Article | 31 March 2014 Paper

Paper

Technology for monitoring shot-level light source performance data to achieve high-optimization of lithography processes

Masato Moriya, Hideyuki Ochiai, Yoshinobu Watabe, Keisuke Ishida, Hiroyuki Masuda, Youichi Sasaki, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9052, 90522E (2014) https://doi.org/10.1117/12.2046128

KEYWORDS: Light sources, Semiconducting wafers, Beam propagation method, Sensors, Polarization, Data acquisition, Lithography, Infrared sensors, Metrology, Liquid crystal lasers

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Proceedings Article | 23 March 2012 Paper

Paper

Development of the reliable high power pulsed carbon dioxide laser system for LPP EUV light source

Takeshi Ohta, Krzysztof Nowak, Takashi Suganuma, Hidenobu Kameda, Masato Moriya, Toshio Yokoduka, Yasufumi Kawasuji, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 8322, 83222O (2012) https://doi.org/10.1117/12.916586

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Light sources, Oscillators, Laser systems engineering, Amplifiers, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, High power lasers

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Proceedings Article | 8 April 2011 Paper

Paper

Development of the reliable 20 kW class pulsed carbon dioxide laser system for LPP EUV light source

Junichi Fujimoto, Takeshi Ohta, Krzysztof Nowak, Takashi Suganuma, Hidenobu Kameda, Masato Moriya, Toshio Yokoduka, Koji Fujitaka, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 7969, 79692S (2011) https://doi.org/10.1117/12.879181

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Light sources, Laser systems engineering, Extreme ultraviolet lithography, Mirrors, Pulsed laser operation, Plasma, Distortion, Thermography

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Proceedings Article | 7 April 2011 Paper

Paper

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Tatsuya Yanagida, Hitoshi Nagano, Takayuki Yabu, Shinji Nagai, Georg Soumagne, Akihiko Kurosu, Krzysztof Nowak, Takashi Suganuma, Masato Moriya, Kouji Kakizaki, Akira Sumitani, Hidenobu Kameda, Hiroaki Nakarai, Junichi Fujimoto

Proceedings Volume 7969, 796908 (2011) https://doi.org/10.1117/12.880382

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Plasma, Plasma systems, Extreme ultraviolet lithography, Light sources, Laser systems engineering, Mirrors, Magnetism

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Proceedings Article | 18 March 2009 Paper

Paper

Evaluation at the intermediate focus for EUV light source

Takashi Suganuma, Georg Soumagne, Masato Moriya, Tamotsu Abe, Akira Sumitani, Akira Endo

Proceedings Volume 7271, 727133 (2009) https://doi.org/10.1117/12.813494

KEYWORDS: Extreme ultraviolet, Mirrors, Carbon dioxide lasers, Light sources, Plasma, Tin, Optical filters, Extreme ultraviolet lithography, Reflectivity, Optical filtering

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Proceedings Article | 18 March 2009 Paper

Paper

Laser-produced plasma source development for EUV lithography

Akira Endo, Hiroshi Komori, Yoshifumi Ueno, Krzysztof Nowak, Yabu Takayuki, Yanagida Tatsuya, Takashi Suganuma, Takeshi Asayama, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Masato Moriya, Toshihiro Nishisaka, Tamotsu Abe, Akira Sumitani, Hitoshi Nagano, Youichi Sasaki, Shinji Nagai, Yukio Watanabe, Georg Soumagne, Takanobu Ishihara, Osamu Wakabayashi, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 7271, 727108 (2009) https://doi.org/10.1117/12.813639

KEYWORDS: Plasma, Tin, Carbon dioxide lasers, Extreme ultraviolet, Magnetism, Laser development, Pulsed laser operation, Extreme ultraviolet lithography, Ions, Laser systems engineering

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Proceedings Article | 12 May 2008 Paper

Paper

Magnetic field for efficient exhaustion of CO2 laser-produced Sn plasma in EUV light source

Yoshifumi Ueno, Georg Soumagne, Takashi Suganuma, Takayuki Yabu, Masato Moriya, Hiroshi Komori, Tamotsu Abe, Akira Endo, Akira Sumitani

Proceedings Volume 7005, 70052U (2008) https://doi.org/10.1117/12.782475

KEYWORDS: Tin, Magnetism, Plasma, Ions, Carbon dioxide lasers, Mirrors, Extreme ultraviolet, Light sources, Carbon dioxide, Nd:YAG lasers

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Proceedings Article | 21 March 2008 Paper

Paper

Magnetic debris mitigation of a CO2 laser-produced Sn plasma

Yoshifumi Ueno, Georg Soumagne, Masato Moriya, Takashi Suganuma, Tamotsu Abe, Hiroshi Komori, Akira Endo, Akira Sumitani

Proceedings Volume 6921, 69212Z (2008) https://doi.org/10.1117/12.771817

KEYWORDS: Tin, Plasma, Magnetism, Carbon dioxide lasers, Ions, Mirrors, Silicon, Extreme ultraviolet, Gold, Statistical analysis

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Proceedings Article | 21 March 2008 Paper

Paper

LPP EUV light source employing high power C02 laser

Hideo Hoshino, Takashi Suganuma, Takeshi Asayama, Krzysztof Nowak, Masato Moriya, Tamotsu Abe, Akira Endo, Akira Sumitani

Proceedings Volume 6921, 692131 (2008) https://doi.org/10.1117/12.771847

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Pulsed laser operation, Optical amplifiers, Laser systems engineering, Light sources, Oscillators, Tin, Carbon dioxide, Laser stabilization

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Proceedings Article | 20 March 2008 Paper

Paper

CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography

Akira Endo, Hideo Hoshino, Takashi Suganuma, Krzysztof Nowak, Tatsuya Yanagida, Takayuki Yabu, Takeshi Asayama, Yoshifumi Ueno, Masato Moriya, Masaki Nakano, Hiroshi Someya, Toshihiro Nishisaka, Tamotsu Abe, Georg Soumagne, Hiroshi Komori, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6921, 69210T (2008) https://doi.org/10.1117/12.771959

KEYWORDS: Tin, Carbon dioxide lasers, Extreme ultraviolet, Ions, Magnetism, Mirrors, Plasma, Pulsed laser operation, Light sources, Carbon dioxide

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Proceedings Article | 21 March 2007 Paper

Paper

Small field exposure tool (SFET) light source

Tamotsu Abe, Takashi Suganuma, Masato Moriya, Takayuki Yabu, Takeshi Asayama, Hiroshi Someya, Yoshifumi Ueno, Georg Soumagne, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 6517, 65173C (2007) https://doi.org/10.1117/12.711241

KEYWORDS: Plasma, Xenon, Light sources, Extreme ultraviolet, Mirrors, Optical filters, Actuators, Laser development, Extreme ultraviolet lithography, High power lasers

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Proceedings Article | 24 March 2006 Paper

Paper

KrF laser driven xenon plasma light source of a small-field exposure tool

Tamotsu Abe, Masato Moriya, Hiroshi Someya, Georg Soumagne, Takashi Suganuma, Takayuki Watanabe, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 6151, 61513T (2006) https://doi.org/10.1117/12.656228

KEYWORDS: Light sources, Xenon, Plasma, Extreme ultraviolet lithography, Laser development, Mirrors, Lithography, Optical filters, Pulsed laser operation, Liquids

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Proceedings Article | 21 March 2006 Paper

Paper

Sub-40nm pattern fabrication in 157nm interferometric immersion lithography

Takuya Hagiwara, Shou Tsuji, Kiyoshi Fujii, Masato Moriya, Osamu Wakabayashi, Akira Sumitani, Yusuke Saito, Kazuhiko Maeda

Proceedings Volume 6154, 61544H (2006) https://doi.org/10.1117/12.656981

KEYWORDS: Refractive index, Liquids, Fluorine, Chemical species, Molecules, Interferometers, Prisms, Immersion lithography, Semiconducting wafers, Transparency

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Proceedings Article | 12 May 2005 Paper

Paper

Development and evaluation of an F2 laser for immersion interference lithography at 157nm

Yasuo Itakura, Youichi Kawasa, Osamu Wakabayashi, Masato Moriya, Shinji Nagai, Akira Sumitani, Takuya Hagiwara, Toshiyuki Ishimaru, Shou Tsuji, Kiyoshi Fujii, Wataru Wakamiya

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599512

KEYWORDS: Polarization, Interferometers, Lithography, Fluorine, Spatial coherence, Prisms, Immersion lithography, Fringe analysis, Laser resonators, Visibility

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Showing 5 of 16 publications

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