Prof. Masato Shibuya Profile

Prof. Masato Shibuya

Professor at Tokyo Polytechnic Univ

SPIE Involvement:

Author

Publications (34)

Proceedings Article | 19 November 2021 Paper

Aberration analysis of zoom lens system with freeform surface lenses using XY polynomial

Motoyuki Ohtake, Masato Shibuya, Lianhua Jin

Proceedings Volume 12078, 120781H (2021) https://doi.org/10.1117/12.2603668

KEYWORDS: Zoom lenses, Lenses, Freeform optics, Modulation transfer functions, Distortion, Augmented reality, Solids, Objectives, Modulation, Medicine

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Proceedings Article | 20 August 2020 Presentation + Paper

Design of a thin see-though optical viewer with a freeform surface

Motoyuki Ohtake, Masato Shibuya, Lianhua Jin

Proceedings Volume 11500, 115000G (2020) https://doi.org/10.1117/12.2571088

KEYWORDS: Prisms, Zernike polynomials, Relays, Freeform optics, Aberration correction, Distortion, Mirrors, Glasses, Monochromatic aberrations

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Proceedings Article | 22 February 2018 Paper

Criteria of limit of applying DOE to precise optics

Hidenori Kasamatsu, Masato Shibuya, Takashi Hiramatsu, Keisuke Araki, Suezou Nakadate

Proceedings Volume 10528, 105281N (2018) https://doi.org/10.1117/12.2288169

KEYWORDS: Fresnel lenses, Diffractive optical elements, Monochromatic aberrations, Precision optics, Spherical lenses, Geometrical optics, Prisms, Optical design, Refractive index, Sun

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Proceedings Article | 19 February 2018 Paper

Development of a color mixer for mixed color education and its outreach activities

S. Nakadate, Y. Kume, M. Shibuya, J. Chen, Y. Azuma, T. Moriyama

Proceedings Volume 10556, 105560H (2018) https://doi.org/10.1117/12.2292976

KEYWORDS: Light emitting diodes, Printing, Color reproduction, Light sources and illumination, LCDs, Translucency, Televisions, Optical filters

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SPIE Journal Paper | 21 August 2017 Open Access

Practical method for evaluating optical image defects caused by center artifacts

Takao Tanabe, Masato Shibuya, Kazuhisa Maehara

OE, Vol. 56, Issue 08, 085103, (August 2017) https://doi.org/10.1117/12.10.1117/1.OE.56.8.085103

KEYWORDS: Statistical analysis, Zernike polynomials, Modulation transfer functions, Mathematical modeling, Image analysis, Tolerancing, Point spread functions, Optics manufacturing, Optical design, Optical engineering

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SPIE Journal Paper | 28 December 2016 Open Access

Aberration properties of odd-order surfaces in optical design

Takao Tanabe, Masato Shibuya

OE, Vol. 55, Issue 12, 125107, (December 2016) https://doi.org/10.1117/12.10.1117/1.OE.55.12.125107

KEYWORDS: Monochromatic aberrations, Optical design, Wavefront aberrations, Extreme ultraviolet lithography, Wavefronts, Zernike polynomials, Reflectivity, Cameras, Optical engineering, Aberration theory

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SPIE Journal Paper | 31 March 2016 Open Access

Special Section Guest Editorial:Photomask Manufacturing Technology

Masato Shibuya, Morihisa Hoga, Kiwamu Takehisa

JM3, Vol. 15, Issue 02, 021001, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021001

KEYWORDS: Photomasks, Manufacturing, Optical lithography, Nanoimprint lithography, Optical proximity correction, Nanotechnology, Printing, Semiconductor lasers, Semiconductors, Extreme ultraviolet

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SPIE Journal Paper | 4 March 2016 Open Access

Theoretical study for aerial image intensity in resist in high numerical aperture projection optics and experimental verification with one-dimensional patterns

Masato Shibuya, Akira Takada, Toshiharu Nakashima

JM3, Vol. 15, Issue 02, 021206, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021206

KEYWORDS: Projection systems, Image processing, Fourier transforms, Optical spheres, Diffraction, Photomasks, Wave propagation, Optical lithography, Lithography, Radio propagation

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SPIE Journal Paper | 1 March 2016 Open Access

Convergence and differentiation of Zernike expansion: application for an analysis of odd-order surfaces

Takao Tanabe, Masato Shibuya, Kazuhisa Maehara

OE, Vol. 55, Issue 03, 035101, (March 2016) https://doi.org/10.1117/12.10.1117/1.OE.55.3.035101

KEYWORDS: Zernike polynomials, Optical design, Optical engineering, Wavefront aberrations, Cameras, Aspheric lenses, Wavefronts, Refraction, Differential equations, Estimation theory

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Proceedings Article | 18 March 2015 Paper

Comparing the experimental resist image with aerial image intensity in high-NA projection lense

Masato Shibuya, Akira Takada, Toshiharu Nakashima

Proceedings Volume 9426, 94261C (2015) https://doi.org/10.1117/12.2085454

KEYWORDS: Optical spheres, Diffraction, Photomasks, Optical lithography, Transmittance, Projection systems, Wave propagation, Semiconducting wafers, Lithography, Geometrical optics

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Proceedings Article | 31 December 2013 Paper

Comprehensive discussion of the projection relations to restrain aberrations caused by change of object distance

Li Ren, M. Shibuya, S. Nakadate

Proceedings Volume 9042, 904207 (2013) https://doi.org/10.1117/12.2034361

KEYWORDS: Monochromatic aberrations, Spherical lenses, Aberration theory, Lens design, Image compression, Distortion, Optical design, Direct methods, Optical spheres, Lithium

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Proceedings Article | 12 April 2013 Paper

Analytical equation predicting the forbidden pattern pitch for phase-shifting mask

Junichi Tamaki, Masato Shibuya, Nakadate Suezou

Proceedings Volume 8683, 86832A (2013) https://doi.org/10.1117/12.2010770

KEYWORDS: Projection systems, Photomasks, Phase shifts, Light, Chemical elements, Solids, Mirrors, Optical lithography, Coherence imaging, Wave propagation

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Proceedings Article | 22 September 2011 Paper

Optical design methods to suppress aberrations which are caused by change of object distance

Shunsuke Hase, Masato Shibuya, Kazuhisa Maehara, Mikio Oka, Suezou Nakadate

Proceedings Volume 8167, 81670Y (2011) https://doi.org/10.1117/12.896762

KEYWORDS: Monochromatic aberrations, Distortion, Optical design, Spherical lenses, 3D displays, Geometrical optics, Lens design, Head-mounted displays, Independent component analysis, Cameras

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Proceedings Article | 21 September 2011 Paper

Considering the pupil coordinate of aberration theory from the view point of the sine condition in the presence of spherical aberration

Masato Shibuya

Proceedings Volume 8167, 816706 (2011) https://doi.org/10.1117/12.896768

KEYWORDS: Monochromatic aberrations, Aberration theory, Adaptive optics, Lens design, Optical spheres, Geometrical optics, Image quality, General applications engineering, Optical engineering, Current controlled current source

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Proceedings Article | 23 March 2011 Paper

Evaluating the performance of DP and EUVL by using analytical equations for resolution of optical lithography with considering required DOF

Masato Shibuya, Kouhei Nogami, Akira Takada, Suezou Nakadate

Proceedings Volume 7973, 79732Y (2011) https://doi.org/10.1117/12.879041

KEYWORDS: Phase shifts, Extreme ultraviolet lithography, Photomasks, Optical lithography, Lithography, Light, Resolution enhancement technologies, Double patterning technology, Optical resolution, Polarization

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SPIE Journal Paper | 1 July 2010

Theoretical investigation of the meaning of odd-order aspherical surface and numerical confirmation of effectiveness in rotational-symmetric but off-axis optics

Masato Shibuya, Kazuhisa Maehara, Yoshihito Ishikawa, Akira Takada, Kei Kobayashi, Mitsunori Toyoda, Masanori Tanikawa, Suezou Nakadate

OE, Vol. 49, Issue 07, 073003, (July 2010) https://doi.org/10.1117/12.10.1117/1.3461991

KEYWORDS: Extreme ultraviolet lithography, Lens design, Optical engineering, Projection systems, Optical design, Monochromatic aberrations, Zernike polynomials, Cameras, Mathematics, Semiconducting wafers

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Proceedings Article | 2 April 2010 Paper

Mask defect inspection by detecting polarization variations

Akira Takada, Masato Shibuya

Proceedings Volume 7638, 76382Y (2010) https://doi.org/10.1117/12.846008

KEYWORDS: Polarization, Inspection, Defect detection, Photomasks, Image transmission, Image sensors, Defect inspection, Lithographic illumination, Image enhancement, Sensors

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SPIE Journal Paper | 1 February 2010

Incoming inclination factor for scalar imaging theory

Akira Takada, Masato Shibuya, Takahiro Saitoh, Akira Nishikata, Kazuhisa Maehara, Suezou Nakadate

OE, Vol. 49, Issue 02, 023202, (February 2010) https://doi.org/10.1117/12.10.1117/1.3319813

KEYWORDS: Diffraction, Point spread functions, Spherical lenses, Wavelets, Optical engineering, Geometrical optics, Optical spheres, Signal attenuation, Wave propagation, Solids

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SPIE Journal Paper | 1 October 2008

Coherence control of illumination optics in mask inspection systems

Akira Takada, Toru Tojo, Masato Shibuya

JM3, Vol. 7, Issue 04, 043010, (October 2008) https://doi.org/10.1117/12.10.1117/1.3013458

KEYWORDS: Inspection, Light, Spatial coherence, Optical inspection, Light sources, Photomasks, Imaging systems, Optical components, Transmittance, Neptunium

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Proceedings Article | 24 March 2008 Paper

Verification of optics for the die-to-wafer-like image mask inspection

Akira Takada, Toru Tojo, Masato Shibuya

Proceedings Volume 6922, 692229 (2008) https://doi.org/10.1117/12.772359

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Optical inspection, Wafer-level optics, Diffraction, Scanners, Computer aided design, Resolution enhancement technologies, Defect inspection

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SPIE Journal Paper | 1 May 2007

Classification of undulated wavefront aberration in projection optics by considering its physical effects

Masato Shibuya, Nobuaki Watanabe, Masayuki Yamamoto, Toshihumi Fukui, Hiromi Ezaki, Tomohiro Kiire, Suezou Nakadate

OE, Vol. 46, Issue 05, 053001, (May 2007) https://doi.org/10.1117/12.10.1117/1.2734995

KEYWORDS: Wavefront aberrations, Projection systems, Wafer-level optics, Optical engineering, Spatial frequencies, Wavefronts, Reticles, Semiconducting wafers, Wave propagation, Point spread functions

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Proceedings Article | 5 April 2007 Paper

Image quality improvement in inspection systems using double integrator illumination

Akira Takada, Hitoshi Suzuki, Toru Tojo, Masato Shibuya

Proceedings Volume 6518, 65184B (2007) https://doi.org/10.1117/12.711286

KEYWORDS: Inspection, Integrated optics, Photomasks, Image sensors, Defect inspection, Image quality, Imaging systems, Image processing, Lenses, Image acquisition

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Proceedings Article | 31 August 2006 Paper

Proposing the inclination factor which satisfies the reciprocity theorem in scalar imaging theory and confirming the validity by numerical calculations

Masato Shibuya, Akira Nishikata, Akira Takada, Suezou Nakadate

Proceedings Volume 6288, 62880D (2006) https://doi.org/10.1117/12.680207

KEYWORDS: Diffraction, Point spread functions, Optical spheres, Spherical lenses, Micro optics, Optical design, Polarization, Wavefronts, Signal attenuation, Imaging systems

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Proceedings Article | 20 January 2006 Paper

Quadrature phase-shifting interferometer using a polarization prism

Tomohiro Kiire, Suezou Nakadate, Masato Shibuya

Proceedings Volume 6027, 60274U (2006) https://doi.org/10.1117/12.668626

KEYWORDS: Interferometers, Fringe analysis, Polarization, Phase shifts, Prisms, Mirrors, Wave plates, Phase interferometry, CCD image sensors, Image sensors

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Proceedings Article | 23 May 2005 Paper

Long distance interferometric measurement using a polarization maintaining fiber

Suezou Nakadate, Ukon Murayama, Masato Shibuya

Proceedings Volume 5855, (2005) https://doi.org/10.1117/12.623283

KEYWORDS: Polarization, Diffraction gratings, Sensors, Distance measurement, Phase measurement, Polarization maintaining fibers, Interferometry, Mirrors, Image sensors, Interferometers

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Proceedings Article | 12 May 2005 Paper

Considering the flare by introducing the random aberration and non-conserved aberration

Masato Shibuya, Nobuaki Watanabe, Hiromi Ezaki, Suezou Nakadate

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600818

KEYWORDS: Wavefront aberrations, Wavefronts, Reticles, Wave propagation, Semiconducting wafers, Fizeau interferometers, Diffraction, Geometrical optics, Fourier transforms, Projection systems

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Proceedings Article | 28 May 2004 Paper

Random aberration and local flare

Masato Shibuya, Hiromi Ezaki, Toshihumi Fukui, Nobuaki Watanabe, Akira Nishikata

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.533979

KEYWORDS: Wavefront aberrations, Wavefronts, Projection systems, Optical lithography, Chromium, Photomasks, Light scattering, Critical dimension metrology, Numerical simulations, Engineering education

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Proceedings Article | 26 June 2003 Paper

Optical lithography at half the Rayleigh resolution limit by two-photon absorption resist

Hiromi Ezaki, Masato Shibuya

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485500

KEYWORDS: Absorption, Polarization, Super resolution, Photon polarization, Optical lithography, Diffraction, Beam splitters, Resolution enhancement technologies, Grazing incidence, Mirrors

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Proceedings Article | 23 December 2002 Paper

Effect of fine undulation of lens surface on the optical performance

Masato Shibuya, Kouichi Aoyagi, Suezou Nakadate, Hiroki Ono

Proceedings Volume 4832, (2002) https://doi.org/10.1117/12.486431

KEYWORDS: Modulation transfer functions, Wavefronts, Diffraction, Optical transfer functions, Spatial frequencies, Lens design, Dysprosium, Adaptive optics, Optical design, Geometrical optics

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Proceedings Article | 30 July 2002 Paper

Improvement of two-photon absorption lithography

Masato Shibuya, Hiromi Ezaki

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474547

KEYWORDS: Resolution enhancement technologies, Photon polarization, Super resolution, Absorption, Lithography, Polarization, Sensors, Photomasks, Mirrors, Molecules

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Proceedings Article | 26 July 1999 Paper

Mathematical treatment of condenser aberrations and their impact on linewidth control

Christof Krautschik, Masato Shibuya, Kenny Toh

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354395

KEYWORDS: Monochromatic aberrations, Reticles, Distortion, Light sources, Photomasks, Image quality, Fiber optic illuminators, Spherical lenses, Lithography, Lithographic illumination

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Proceedings Article | 15 April 1993 Paper

Resolution versus depth of focus in the resolution-enhanced optical system for lithography

Masato Shibuya, Tadao Tsuruta

Proceedings Volume 1780, 178005 (1993) https://doi.org/10.1117/12.142834

KEYWORDS: Lithography, Lithographic illumination, Optical lithography, Image enhancement, Optical resolution, Diffraction, Image resolution, Fringe analysis, Coherence (optics)

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Proceedings Article | 4 March 1993 Paper

Resolution versus depth of focus in the resolution-enhanced optical system for lithography

Masato Shibuya, Tadao Tsuruta

Proceedings Volume 1782, (1993) https://doi.org/10.1117/12.141055

KEYWORDS: Lithography, Lithographic illumination, Thin films, Image resolution, Phase shifts, Light sources, Optical lithography, Fringe analysis, Diffraction, Image processing

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Proceedings Article | 1 January 1991 Paper

Exact sine condition in the presence of spherical aberration

Masato Shibuya

Proceedings Volume 1354, (1991) https://doi.org/10.1117/12.47922

KEYWORDS: Monochromatic aberrations, Ray tracing, Wavefronts, Lens design, Geometrical optics, Spherical lenses, Optical spheres, Optical design, Refractive index, Lutetium

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