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Maxime Cannac
at CEA-LETI
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 13 October 2020 Presentation + Paper
Hybrid E-beam lithography and process improvement for nanodevice fabrication
I. Servin, F. Laulagnet, M. Cannac, Ahmed Gharbi, J-A. Dallery
Proceedings Volume 11518, 115180U (2020) https://doi.org/10.1117/12.2572868
KEYWORDS: Electron beam lithography, Lithography, Deep ultraviolet, Optical alignment, 193nm lithography, Electron beam direct write lithography, Semiconducting wafers, Nanostructures, Nanolithography, Electron beams
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