Mr. Melchior Mulder Profile

Melchior Mulder

Senior Designer at ASML Netherlands BV

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Author

Publications (10)

Proceedings Article | 10 May 2018 Paper

Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W

Michael Purvis, Igor Fomenkov, Alexander Schafgans, Mike Vargas, Spencer Rich, Yezheng Tao, Slava Rokitski, Melchior Mulder, Erik Buurman, Michael Kats, Jayson Stewart, Andrew LaForge, Chirag Rajyaguru, Georgiy Vaschenko, Alex Ershov, Robert Rafac, Mathew Abraham, David Brandt, Daniel Brown

Proceedings Volume 10583, 1058327 (2018) https://doi.org/10.1117/12.2305955

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Plasma, Tin, High volume manufacturing, Semiconducting wafers, Reflectivity, EUV optics, Photoresist materials

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Proceedings Article | 4 March 2010 Paper

Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners

Jörg Zimmermann, Paul Gräupner, Jens Neumann, Dirk Hellweg, Dirk Jürgens, Michael Patra, Christoph Hennerkes, Manfred Maul, Bernd Geh, Andre Engelen, Oscar Noordman, Melchior Mulder, Sean Park, Joep De Vocht

Proceedings Volume 7640, 764005 (2010) https://doi.org/10.1117/12.847282

KEYWORDS: Diffractive optical elements, Fiber optic illuminators, Reticles, Lithographic illumination, Mirrors, Critical dimension metrology, Distortion, Source mask optimization, Manufacturing, Semiconducting wafers

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Proceedings Article | 4 March 2010 Paper

Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems

Melchior Mulder, André Engelen, Oscar Noordman, Gert Streutker, Bert van Drieenhuizen, Cas van Nuenen, Wilfred Endendijk, Jef Verbeeck, Wim Bouman, Anita Bouma, Robert Kazinczi, Robert Socha, Dirk Jürgens, Joerg Zimmermann, Bastian Trauter, Joost Bekaert, Bart Laenens, Daniel Corliss, Greg McIntyre

Proceedings Volume 7640, 76401P (2010) https://doi.org/10.1117/12.845984

KEYWORDS: Mirrors, Diffractive optical elements, Fiber optic illuminators, Source mask optimization, Imaging systems, Electroluminescence, Polarization, Semiconducting wafers, Photomasks, Light

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Proceedings Article | 4 March 2010 Paper

Freeform illumination sources: an experimental study of source-mask optimization for 22-nm SRAM cells

J. Bekaert, B. Laenens, S. Verhaegen, L. Van Look, D. Trivkovic, F. Lazzarino, G. Vandenberghe, P. van Adrichem, R. Socha, S. Baron, M. C. Tsai, K. Ning, S. Hsu, H. Y. Liu, M. Mulder, A. Bouma, E. van der Heijden, O. Mouraille, K. Schreel, J. Finders, M. Dusa, J. Zimmermann, P. Gräupner, J. T. Neumann, C. Hennerkes

Proceedings Volume 7640, 764008 (2010) https://doi.org/10.1117/12.846918

KEYWORDS: Source mask optimization, Photomasks, Semiconducting wafers, Diffractive optical elements, Manufacturing, Double patterning technology, Scanners, Electroluminescence, Fiber optic illuminators, Optical lithography

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Proceedings Article | 11 December 2009 Paper

Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems

Melchior Mulder, André Engelen, Oscar Noordman, Robert Kazinczi, Gert Streutker, Bert van Drieenhuizen, Stephen Hsu, Keith Gronlund, Markus Degünther, Dirk Jürgens, Johannes Eisenmenger, Michael Patra, Andras Major

Proceedings Volume 7520, 75200Y (2009) https://doi.org/10.1117/12.837035

KEYWORDS: Mirrors, Fiber optic illuminators, Diffractive optical elements, Source mask optimization, Micromirrors, Light, Metrology, Semiconducting wafers, Switching, Scanners

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Proceedings Article | 16 March 2009 Paper

Imaging solutions for the 22nm node using 1.35NA

André Engelen, Melchior Mulder, Igor Bouchoms, Steve Hansen, Anita Bouma, Anthony Ngai, Marieke van Veen, Jörg Zimmermann

Proceedings Volume 7274, 72741Q (2009) https://doi.org/10.1117/12.814155

KEYWORDS: Polarization, Scanners, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Double patterning technology, Image segmentation, Design for manufacturing, Diffraction, Cadmium

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Proceedings Article | 26 June 2003 Paper

Optimizing and enhancing optical systems to meet the low k₁ challenge

Donis Flagello, Robert Socha, Xuelong Shi, Jan van Schoot, Jan Baselmans, Mark van de Kerkhof, Wim de Boeij, Andre Engelen, Rene Carpaij, Oscar Noordman, Marco Moers, Melchior Mulder, Jo Finders, Henk van Greevenbroek, Martin Schriever, Manfred Maul, Helmut Haidner, Markus Goeppert, Ulrich Wegmann, Paul Graeupner

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485340

KEYWORDS: Lithographic illumination, Reticles, Wavefronts, Sensors, Semiconducting wafers, Light scattering, Lithography, Critical dimension metrology, Scanners, Control systems

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Proceedings Article | 30 July 2002 Paper

Flare and its impact on low-k1 KrF and ArF lithography

Bruno La Fontaine, Mircea Dusa, Alden Acheta, Cinti Chen, Anatoly Bourov, Harry Levinson, Lloyd Litt, Melchior Mulder, Rolf Seltman, Judith van Praagh

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474598

KEYWORDS: Modulation transfer functions, Point spread functions, Spatial frequencies, Photomasks, Scanners, Modulation, Lithography, Light scattering, Semiconducting wafers, Critical dimension metrology

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Proceedings Article | 22 January 2001 Paper

Reticle error correction for lithography tool qualification benefits and limitations

Ton Kiers, Melchior Mulder, Jan van Schoot, Jacques Waelpoel, Robert Uitz

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410696

KEYWORDS: Reticles, Atrial fibrillation, Semiconducting wafers, Photomasks, Metrology, Scanners, Lithography, Etching, Pellicles, Laser scattering

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Proceedings Article | 26 July 1999 Paper

0.7-NA DUV step-and-scan system for 150-nm imaging with improved overlay

Jan van Schoot, Frank Bornebroek, Manfred Suddendorf, Melchior Mulder, Jeroen van der Spek, Jan Stoeten, Adolph Hunter, Peter Ruemmer

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354357

KEYWORDS: Semiconducting wafers, Optical alignment, Imaging systems, Distortion, Deep ultraviolet, Reticles, Monochromatic aberrations, Photoresist materials, Diffraction, Scanning electron microscopy

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Showing 5 of 10 publications

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