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Michael Asturias
Application Engineer at Intel Corp
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Publications (2)
Proceedings Article | 21 October 2014 Paper
Mask data processing in the era of multibeam writers
Proceedings Volume 9235, 92350W (2014) https://doi.org/10.1117/12.2072135
KEYWORDS: Photomasks, Semiconducting wafers, Vestigial sideband modulation, Monte Carlo methods, Diffusion, Data processing, Optical proximity correction, Electron beam lithography, Raster graphics, Computer aided design
Proceedings Article | 23 September 2009 Paper
Deployment of OASIS.MASK (P44) as direct input for mask inspection of advanced photomasks
Suheil Zaatri, Yan Liu, Michael Asturias, Joan McCall, Wei-Guo Lei, Tsafi Lapidot, Khen Ofek, Aviram Tam, Mark Wagner, Amanda Bowhill, Emile Sahouria, Minyoung Park, Neil DeBella, Pradiptya Ghosh, Steffen Schulze
Proceedings Volume 7488, 748823 (2009) https://doi.org/10.1117/12.833443
KEYWORDS: Inspection, Photomasks, Metrology, Vestigial sideband modulation, Data conversion, Data processing, Manufacturing, Standards development, Semiconducting wafers, Computer simulations
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