Mr. Michael P. Duane Profile

Michael P. Duane

SMTS at Applied Materials Inc

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 4 March 2008 Paper

APF pitch-halving for 22nm logic cells using gridded design rules

Michael Smayling, Christopher Bencher, Hao Chen, Huixiong Dai, Michael Duane

Proceedings Volume 6925, 69251E (2008) https://doi.org/10.1117/12.772905

KEYWORDS: Logic, Photomasks, Optical lithography, Etching, Transistors, Double patterning technology, Chemical vapor deposition, Semiconducting wafers, Dielectrics, Image processing

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Proceedings Article | 16 June 2005 Paper

ALTA 4700 system mask patterning performance improvements for X-architecture and wafer electrical performance interchangeability with 50kV E-beam

Paul Allen, Mike Bohan, Eric Christenson, H. Dai, M. Duane, H. Hamaker, Sam Howells, Boaz Kenan, Peter Pirogovsky, Malik Sadiq, Robin Teitzel, Michael White

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637280

KEYWORDS: Semiconducting wafers, Photomasks, Metals, Reticles, Deep ultraviolet, Optical proximity correction, Manufacturing, Electron beam lithography, Lithography, Control systems

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Proceedings Article | 6 December 2004 Paper

Accelerating yield ramp through design and manufacturing collaboration

Robin Sarma, Huixiong Dai, Michael Smayling, Michael Duane

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.572591

KEYWORDS: Photomasks, Semiconducting wafers, Manufacturing, Design for manufacturability, Reticles, Vestigial sideband modulation, Diagnostics, Failure analysis, Optical proximity correction, Resolution enhancement technologies

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Proceedings Article | 3 May 2004 Paper

Taking the X Architecture to the 65-nm technology node

Robin Sarma, Michael Smayling, Narain Arora, Toshiyuki Nagata, Michael Duane, Santosh Shah, Harris Keston, Shiany Oemardani

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.536130

KEYWORDS: Photomasks, Manufacturing, Metals, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Resistance, Lithography, Dielectrics, Copper

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Proceedings Article | 3 May 2004 Paper

Manufacturability of the X Architecture at the 90-nm technology node

Michael Smayling, Robin Sarma, Toshiyuki Nagata, Narain Arora, Michael Duane, Shiany Oemardani, Santosh Shah

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.536027

KEYWORDS: Optical proximity correction, Resistance, Manufacturing, Semiconducting wafers, Resistors, Metals, Lithography, Scanners, Metrology, Photomasks

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