Dr. Michael Schneider Profile

Dr. Michael Schneider

at TU Wien

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 14 June 2017 Presentation + Paper

FT-IR analysis of high temperature annealing effects in a-SiC:H thin films

Tobias Frischmuth, Michael Schneider, Thomas Grille, U. Schmid

Proceedings Volume 10246, 102460R (2017) https://doi.org/10.1117/12.2266844

KEYWORDS: Thin films, FT-IR spectroscopy, Annealing, Silicon carbide, Hydrogen, Chemical analysis, Plasma, Silicon, Silicon films, Thin film deposition, Argon, Plasma enhanced chemical vapor deposition, Microelectromechanical systems

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Proceedings Article | 21 May 2015 Paper

High temperature performance of sputter-deposited piezoelectric aluminum nitride thin films

M. Gillinger, M. Schneider, A. Bittner, P. Nicolay, U. Schmid

Proceedings Volume 9517, 951707 (2015) https://doi.org/10.1117/12.2179442

KEYWORDS: Aluminum nitride, Annealing, Thin films, Oxygen, Nitrogen, Temperature metrology, Atomic force microscopy, Silicon, Silicon films, Diffusion

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Proceedings Article | 17 May 2013 Paper

Investigation on the dielectric behavior of aluminum nitride thin films at different temperatures applying a time-zero approach

Michael Schneider, Achim Bittner, Ulrich Schmid

Proceedings Volume 8763, 87631X (2013) https://doi.org/10.1117/12.2017066

KEYWORDS: Aluminum nitride, Thin films, Dielectrics, Silicon, Temperature metrology, Silicon films, Dielectric breakdown, Semiconducting wafers, Electrodes, Reliability

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Proceedings Article | 5 May 2011 Paper

Improved load-deflection method for the extraction of elastomechanical properties of circularly shaped thin-film diaphragms

Johannes Schalko, Roman Beigelbeck, Michael Stifter, Michael Schneider, Achim Bittner, Ulrich Schmid

Proceedings Volume 8066, 80661J (2011) https://doi.org/10.1117/12.886824

KEYWORDS: Aluminum nitride, Thin films, Plasma enhanced chemical vapor deposition, Semiconducting wafers, Carbon nanotubes, Oxides, Sensors, Actuators, Silicon, Aluminum

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Proceedings Article | 5 May 2011 Paper

Modeling and analysis of a micromachined piezoelectric energy harvester stimulated by ambient random vibrations

Ali B. Alamin Dow, Hasan A. Al-Rubaye, David Koo, Michael Schneider, Achim Bittner, Ulrich Schmid, Nazir Kherani

Proceedings Volume 8066, 806612 (2011) https://doi.org/10.1117/12.885861

KEYWORDS: Aluminum nitride, Microelectromechanical systems, Instrument modeling, Thin films, Actuators, Data modeling, Electrodes, Silicon films, Silicon, Thin film devices

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