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Michel Habets
at Technische Univ. Eindhoven
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Publications (1)
Proceedings Article | 18 March 2016 Paper
Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography
Michel Habets, Joni Scholten, Siep Weiland, Wim Coene
Proceedings Volume 9776, 97762D (2016) https://doi.org/10.1117/12.2219168
KEYWORDS: Optical aberrations, Thermal effects, Mirrors, Extreme ultraviolet lithography, Adaptive optics, Deformable mirrors, Projection systems, Actuators, Distortion, Wavefronts, Electroluminescent displays, Thermal modeling
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