Ming Yun Chen
at Synopsys Taiwan Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 16 September 2022 Paper
Proceedings Volume 12325, 123250A (2022) https://doi.org/10.1117/12.2642161
KEYWORDS: Photomasks, Data modeling, Calibration, Optical proximity correction, Metrology, Lithography, Optimization (mathematics), Manufacturing

Proceedings Article | 23 March 2020 Paper
Jiunhau Fu, Chiang Lin Shih, Chun Cheng Liao, Eric Huang, Elsley Tan, John Tsai, Ming Yun Chen, Yuan Pin Liao, Seung Hee Baek
Proceedings Volume 11323, 113232H (2020) https://doi.org/10.1117/12.2551669
KEYWORDS: Optical proximity correction, Extreme ultraviolet, Molybdenum, Photomasks, Data modeling, Critical dimension metrology, Source mask optimization, Semiconducting wafers, EUV optics, Array processing

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