Mr. Moonsuk Yi Profile

Moonsuk Yi

at Lawrence Berkeley National Lab

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 16 June 2003 Paper

Defect repair for extreme-ultraviolet lithography (EUVL) mask blanks

Stefan Hau-Riege, Anton Barty, Paul Mirkarimi, Daniel Stearns, Henry Chapman, Donald Sweeney, W. Miles Clift, Eric Gullikson, Moon-Suk Yi

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484729

KEYWORDS: Reflectivity, Photomasks, Extreme ultraviolet lithography, Silicon carbide, Multilayers, Carbon, Silicon, Yield improvement, Ion beams, Critical dimension metrology

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Proceedings Article | 27 December 2002 Paper

Evaluation of the capability of a multibeam confocal inspection system for inspection of EUVL mask blanks

Alan Stivers, Ted Liang, Michael Penn, Barry Lieberman, Gilbert Shelden, James Folta, Cindy Larson, Paul Mirkarimi, Christopher Walton, Eric Gulliksong, Moonsuk Yi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468199

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect detection, Particles, Gold, Extreme ultraviolet lithography, Semiconducting wafers, Optical spheres, Multilayers

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Proceedings Article | 1 July 2002 Paper

EUVL mask blank repair

Anton Barty, Paul Mirkarimi, Daniel Stearns, Donald Sweeney, Henry Chapman, W. Miles Clift, Scott Hector, Moonsuk Yi

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472313

KEYWORDS: Multilayers, Reflectivity, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Silicon, Ion beams, Molybdenum, Particles, Lithography

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Proceedings Article | 1 July 2002 Paper

At-wavelength inspection of defect smoothing in EUVL masks

Moonsuk Yi, Min-Cheol Park, Paul Mirkarimi, Cindy Larson, Jeffrey Bokor

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472314

KEYWORDS: Extreme ultraviolet lithography, Inspection, Photomasks, Gold, Optical spheres, Scanners, Defect inspection, Multilayers, Reflectivity, Extreme ultraviolet

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Proceedings Article | 7 July 1997 Paper

Evaluation of aerial image in XRL

Moonsuk Yi, Ohyun Kim, Srinivas Bollepalli, Mumit Khan, Franco Cerrina

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275769

KEYWORDS: Image quality, Image processing, Photomasks, Lithography, X-ray lithography, Gold, Image analysis, Semiconducting wafers, X-rays, Image acquisition

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