With shrinking feature sizes and error budgets in OPC models, effective pattern coverage and accurate measurement
become more and more challenging. The goal of pattern selection is to maximize the efficiency of gauges used in model
calibration. By optimizing sample plan for model calibration, we can reduce the metrology requirement and modeling
turn-around time, without sacrificing the model accuracy and stability. With the Tachyon pattern-selection-tool, we seek
to parameterize the patterns, by assessing dominant characteristics of the surroundings of the point of interest. This
allows us to represent each pattern with one vector in a finite-dimensional space, and the entire patterns pool with a set
of vectors. A reduced but representative set of patterns can then be automatically selected from the original full set
sample data, based on certain coverage criteria. In this paper, we prove that the model built with 56% reduced wafer data
could achieve comparable quality as the model built with full set data.
KEYWORDS: Calibration, Process modeling, Lithography, Resolution enhancement technologies, Design for manufacturing, Semiconducting wafers, Prototyping, 3D modeling, Scanning electron microscopy, Printing
With the upcoming technology generations, it will become more and more challenging to provide a good yield and a
fast yield ramp. The contribution of Resolution Enhancement Technologies (RET) to Design for Manufacturability
(DfM) targets is to provide a good printability over the whole process window and the control by print image simulation
(PW-ORC) and to identify and remove yield issues imprinted in the drawn layout in early phases of the design flow.
Such a lithography-aware design data flow, which we call LfD (Litho-friendly Design) will be a very important step
towards a fully developed DfM environment.
We report in this paper the application of a LfD design flow used for library cells at the MAPLE, an Infineon 65 nm
design prototype fabricated by Chartered. The results of the process variability analysis are verified by experimental
results (dose-focus exposure matrices).
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