Dr. Nathan Marchack
Research Staff Member at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 1 May 2023 Presentation + Paper
Osakpolo Isowamwen, Nathan Marchack, Devi Koty, Qingyun Yang, Hien Nguyen, Steve Molis, Scott Lefevre, Marco Hopstaken, Andy Metz, Jeff Shearer, Robert Bruce
Proceedings Volume 12499, 124990H (2023) https://doi.org/10.1117/12.2658564
KEYWORDS: Etching, Passivation, Ions, Sustainability, Plasma etching, Scanning electron microscopy, Semiconductors, Semiconductor manufacturing, Semiconducting wafers, Plasma

Proceedings Article | 25 May 2022 Presentation + Paper
John Papalia, Devi Koty, Nathan Marchack, Scott Lefevre, Qingyun Yang, Aelan Mosden, Sebastian Engelmann, Robert Bruce
Proceedings Volume 12056, 1205603 (2022) https://doi.org/10.1117/12.2614264
KEYWORDS: Etching, Polymers, Diffusion, Plasma etching, Ions, Silicon, Plasma, Semiconducting wafers, Scanning electron microscopy, Deep reactive ion etching, Reactive ion etching, Packaging

Proceedings Article | 17 May 2019 Presentation + Paper
Proceedings Volume 11010, 110100B (2019) https://doi.org/10.1117/12.2519206
KEYWORDS: Sensors, Waveguides, Photonic integrated circuits, Spectroscopy, Silicon, Semiconductor lasers, Silicon photonics, Integrated photonics, Sensor networks, Fabry–Perot interferometers

Proceedings Article | 16 May 2018 Presentation + Paper
Eric Zhang, Chu Teng, Theodore van Kessel, Levente Klein, Ramachandran Muralidhar, Chi Xiong, Yves Martin, Jason Orcutt, Marwan Khater, Laurent Schares, Tymon Barwicz, Nathan Marchack, Swetha Kamlapurkar, Sebastian Engelmann, Gerard Wysocki, Norma Sosa, William M. Green
Proceedings Volume 10629, 106290Y (2018) https://doi.org/10.1117/12.2305174
KEYWORDS: Sensors, Spectroscopy, Methane, Optical sensors, Photodetectors, Absorption spectroscopy, Absorption, Calibration, Absorbance

Proceedings Article | 21 March 2017 Presentation + Paper
Nathan Marchack, Marwan Khater, Jason Orcutt, Josephine Chang, Steven Holmes, Tymon Barwicz, Swetha Kamlapurkar, William Green, Sebastian Engelmann
Proceedings Volume 10149, 101490F (2017) https://doi.org/10.1117/12.2258112
KEYWORDS: Line edge roughness, Silicon, Reactive ion etching, Waveguides, Sensor technology, Optical lithography, Silicon photonics, Waveguide sensors, Sensors, Integrated circuits, Plasma, Etching, Line width roughness, Photomasks, Plasma etching, Lithography

Showing 5 of 6 publications
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