Currently, there are various methods to control the layers thicknesses during their manufacture and optical monitoring method is the basically used most often today. In this paper, we consider a method for determining the monitoring wavelength to control the optical thickness of each layer during its fabrication. By applying the method, it is possible to reduce errors in layer thicknesses and to obtain the spectral characteristic of the transmittance (or reflection) of the experimental coating that is maximally close to the theoretical spectra. The experimental results of thin films with high spectral performance showed that the method can effectively reduce the errors in layers thickness.
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