Mr. Noriyuki Harashima Profile

Noriyuki Harashima

at ULVAC Coating Corp

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 13 July 2017 Paper

Quartz 9-inch size mask blanks for ArF PSM (Phase Shift Mask)

Noriyuki Harashima, Tatsuya Isozaki, Arata Kawanishi, Shuichiro Kanai, Kagehiro Kageyama, Hiroyuki Iso, Tatsuya Chishima

Proceedings Volume 10454, 104540S (2017) https://doi.org/10.1117/12.2282803

KEYWORDS: Photomasks, Chromium, Coating, Binary data, Quartz, Polishing, Lithography, Semiconducting wafers, Absorbance, Phase shifts

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Proceedings Article | 4 October 2016 Paper

Prototyping 9-inch size PSM mask blanks for 450mm wafer process (2016)

Noriyuki Harashima, Hiroyuki Iso, Tatsuya Chishima

Proceedings Volume 9985, 99851H (2016) https://doi.org/10.1117/12.2241378

KEYWORDS: Photomasks, Semiconducting wafers, Prototyping, Semiconductors, Binary data, Chromium, Coating, Polishing, Transmittance, Glasses

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Proceedings Article | 11 November 2015 Paper

New grade of 9-inch size mask blanks for 450mm wafer process (2015)

Noriyuki Harashima, Hiroyuki Iso, Tatsuya Chishima

Proceedings Volume 9635, 96351L (2015) https://doi.org/10.1117/12.2196958

KEYWORDS: Photomasks, Semiconducting wafers, Quartz, Glasses, Polishing, Coating, Lithography, Binary data, Chromium, Semiconductors

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Proceedings Article | 8 October 2014 Paper

New grade of 9-inch size mask blanks for 450mm wafer process

Noriyuki Harashima, Hiroyuki Iso, Tatsuya Chishima

Proceedings Volume 9235, 92351M (2014) https://doi.org/10.1117/12.2066075

KEYWORDS: Photomasks, Semiconducting wafers, Glasses, Quartz, Coating, Polishing, Lithography, Binary data, Chromium, Semiconductors

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Proceedings Article | 8 November 2005 Paper

The possibility of CrOx as the top coating material on a MoSi HT

Noriyuki Harashima, Hiroyuki Iso, Tatsuya Isozaki, Naohiro Umeo, Takaei Sasaki

Proceedings Volume 5992, 59923R (2005) https://doi.org/10.1117/12.633291

KEYWORDS: Binary data, Chromium, Dry etching, Etching, Metals, Thin films, Coating, Critical dimension metrology, Photomasks, Absorbance

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Proceedings Article | 6 December 2004 Paper

New structure of ArF high-transmittance attenuated phase-shifting mask with dry etching process

Hiroyuki Iso, Noriyuki Harashima, Tatsuya Isozaki, Shuichiro Kanai, Takaei Sasaki

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.579067

KEYWORDS: Transmittance, Etching, Dry etching, Quartz, Photomasks, Phase shifts, Silica, Chromium, Reflectivity, Mask making

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Proceedings Article | 28 August 2003 Paper

Advanced NLD mask dry etching system for 90-nm node technology

Noriyuki Harashima, Takaei Sasaki, Kiyoshi Kuwahara, Toshio Hayashi, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Mutsumi Hara, Yukio Ohkubo

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504200

KEYWORDS: Photomasks, Etching, Dry etching, Plasma, Helium, Magnetism, Chromium, Scanning electron microscopy, Semiconductors, Lithography

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Proceedings Article | 27 December 2002 Paper

Improvement of NLD mask dry etching system for 100-nm-node technology

Yoshiyuki Tanaka, Nobuyuki Yoshioka, Noriyuki Harashima, Takaei Sasaki, Kiyoshi Kuwahara, Toshio Hayashi, Mutsumi Hara, Yasushi Ohkubo

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467914

KEYWORDS: Antennas, Etching, Dry etching, Photomasks, Plasma, Lithography, Photoresist processing, Control systems, Modulation

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Proceedings Article | 22 January 2001 Paper

Evaluation of loading effect of NLD dry etching: II

Tatsuya Fujisawa, Takayuki Iwamatsu, Koji Hiruta, Hiroaki Morimoto, Noriyuki Harashima, Takaei Sasaki, Mutsumi Hara, Kazuhide Yamashiro, Yasushi Okubo, Yoichi Takehana

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410736

KEYWORDS: Etching, Dry etching, Plasma, Photoresist processing, Critical dimension metrology, Antennas, Optical proximity correction, Magnetism, Quartz, Semiconductors

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Proceedings Article | 19 July 2000 Paper

Evaluation of loading effect of NLD dry etching

Takayuki Iwamatsu, Tatsuya Fujisawa, Koji Hiruta, Hiroaki Morimoto, Noriyuki Harashima, Takaei Sasaki, Mutsumi Hara, Kazuhide Yamashiro, Yasushi Okubo, Yoichi Takehana

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392060

KEYWORDS: Etching, Dry etching, Photomasks, Critical dimension metrology, Scanning electron microscopy, Mask making, Plasma, Photoresist processing, Plasma etching, Chromium

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Proceedings Article | 25 August 1999 Paper

Advanced Cr dry etching process

Satoshi Aoyama, Shouichi Sakamoto, Tsutomu Koike, Nobuyuki Yoshioka, Noriyuki Harashima, Atsushi Hayashi, Takaei Sasaki

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360246

KEYWORDS: Etching, Chromium, Photomasks, Dry etching, Logic, Critical dimension metrology, Scanning electron microscopy, Logic devices, Reactive ion etching, Plasma etching

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Showing 5 of 11 publications

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