Mr. Paul D. Harris Profile

Paul D. Harris

at Nikon Precision Europe GmbH

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 28 May 2004 Paper

A 90-nm design-rule patterning application using alt-PSM with KrF lithography for volume manufacturing at k1=0.27

Stefan Majoni, Frank Driessen, Bryan Kasprowicz, Paul Harris

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544254

KEYWORDS: Photomasks, Lithography, Manufacturing, Nanoimprint lithography, Optical lithography, Phase shifts, Photoresist processing, Semiconducting wafers, Monochromatic aberrations, Semiconductors

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Compensation for imaging errors in EUV lithography

Paul Harris, Martin McCallum

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.533725

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Optical proximity correction, Semiconducting wafers, Coherence (optics), Computer simulations, Electromagnetism, Transmissive materials

Read Abstract +

Proceedings Article | 16 June 2003 Paper

Optical inspection of EPL stencil masks

James Welsh, Martin McCallum, Masashi Okada

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482371

KEYWORDS: Inspection, Photomasks, Defect detection, Silicon, Optical inspection, Imaging systems, Scanning electron microscopy, Diffraction, Non-optical lithography, Lithography

Read Abstract +

Proceedings Article | 2 June 2003 Paper

Practical DUV lithography for the optoelectronics market

Paul Harris, Martin McCallum, David Muir, Gordon Hughes, Stuart Pinkney

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482810

KEYWORDS: Deep ultraviolet, Reticles, Semiconducting wafers, Optical alignment, Lithography, Scanners, Overlay metrology, Metrology, Computer aided design, Critical dimension metrology

Read Abstract +

Proceedings Article | 30 July 2002 Paper

Effect of aberrations on defect printing and inspection

Paul Harris, Martin McCallum

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474533

KEYWORDS: Quantum efficiency, Picosecond phenomena, Printing, Inspection, Defect inspection, Quartz, Critical dimension metrology, Imaging systems, Gemini Planet Imager, Optical lithography

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years