Dr. Paul T. Konkola
at Eyekon Systems LLC
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 29 January 2004 Paper
Proceedings Volume 5168, (2004) https://doi.org/10.1117/12.510258
KEYWORDS: Semiconducting wafers, Silicon, Etching, Diffraction gratings, Assembly tolerances, Optical fabrication, Optical lithography, Metrology, Nanoimprint lithography, Roentgenium

Proceedings Article | 11 March 2003 Paper
Craig Forest, Mark Schattenburg, Carl Chen, Ralf Heilmann, Paul Konkola, JoHanna Przbylowski, Yanxia Sun, Jenny You, Steven Kahn, Donald Golini
Proceedings Volume 4851, (2003) https://doi.org/10.1117/12.461477
KEYWORDS: Metrology, Assembly tolerances, Wavefront sensors, Surface finishing, X-rays, Silicon, Reflection, Polishing, Semiconducting wafers, Sensors

Proceedings Article | 13 November 2002 Paper
Proceedings Volume 4936, (2002) https://doi.org/10.1117/12.469431
KEYWORDS: Interferometers, Metrology, Lithography, Optical alignment, Beam splitters, Mirrors, Heterodyning, Wavefront metrology, Interferometry, Signal processing

Proceedings Article | 30 January 2002 Paper
Ralf Heilmann, Glen Monnelly, Olivier Mongrard, Nat Butler, Carl Chen, Lester Cohen, Christopher Cook, Lee Goldman, Paul Konkola, Michael McGuirk, George Ricker, Mark Schattenburg
Proceedings Volume 4496, (2002) https://doi.org/10.1117/12.454373
KEYWORDS: Glasses, Semiconducting wafers, Silicon, Particles, Epoxies, Coating, Reflection, Thin films, X-ray optics, Mirrors

Proceedings Article | 30 January 2002 Paper
Proceedings Volume 4485, (2002) https://doi.org/10.1117/12.454273
KEYWORDS: Interferometers, Lithography, Beam splitters, Diffraction gratings, Digital signal processing, Mirrors, Optics manufacturing, Signal processing, Optical lithography, Electron beam lithography

Showing 5 of 6 publications
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