Dr. Paul Tuffy Profile

Dr. Paul Tuffy

Product Manager at ASML

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Publications (5)

Proceedings Article | 30 March 2017 Paper

Computational scanner wafer mark alignment

Boris Menchtchikov, Robert Socha, Sudharshanan Raghunathan, Irina Lyulina, Hielke Schoonewelle, Patrick Tinnemans, Paul Tuffy, Philippe Leray, Christiane Jehoul

Proceedings Volume 10147, 101471C (2017) https://doi.org/10.1117/12.2259750

KEYWORDS: Far infrared, Optical alignment, Semiconducting wafers, Sensors, Signal detection, Avalanche photodetectors, Signal processing, Scanners, Optical lithography, Overlay metrology

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Proceedings Article | 20 October 2016 Paper

Eliminating the offset between overlay metrology and device patterns using computational metrology target design

Jianming Zhou, Sarah Wu, Craig Hickman, Ewoud van West, Maurits van der Schaar, Wangshi Zhou, Youping Zhang, Sean Park, Paul Tuffy, Dan Ulmer, Cedric Affentauschegg, Henk Niesing

Proceedings Volume 9778, 97781G (2016) https://doi.org/10.1117/12.2219439

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Proceedings Article | 24 March 2016 Paper

Improving scanner wafer alignment performance by target optimization

Philippe Leray, Christiane Jehoul, Robert Socha, Boris Menchtchikov, Sudhar Raghunathan, Eric Kent, Hielke Schoonewelle, Patrick Tinnemans, Paul Tuffy, Jun Belen, Rich Wise

Proceedings Volume 9778, 97782M (2016) https://doi.org/10.1117/12.2219491

KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Scanners, Etching, Avalanche photodetectors, Optical lithography, Silicon, Metrology, Chemical mechanical planarization

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Proceedings Article | 24 March 2016 Paper

OPC optimization techniques for enabling the reduction of mismatch between overlay metrology and the device pattern cell

Shinyoung Kim, Chanha Park, Jinhyuck Jun, Jaehee Hwang, Hyunjo Yang, Nang-Lyeom Oh, Sean Park, Chris Park, Kyu-Tae Sun, Youping Zhang, Paul Tuffy

Proceedings Volume 9778, 97781S (2016) https://doi.org/10.1117/12.2219467

KEYWORDS: Overlay metrology, Optical proximity correction, Diffraction, Critical dimension metrology, Metrology, Scanning electron microscopy, Electron microscopes, Optical lithography, Error analysis, Target detection

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Proceedings Article | 19 March 2015 Paper

Improving full-wafer on-product overlay using computationally designed process-robust and device-like metrology targets

Young-Sik Kim, Young-Sun Hwang, Mi-Rim Jung, Ji-Hwan Yoo, Won-Taik Kwon, Kevin Ryan, Paul Tuffy, Youping Zhang, Sean Park, Nang-Lyeom Oh, Chris Park, Mir Shahrjerdy, Roy Werkman, Kyu-Tae Sun, Jin-Moo Byun

Proceedings Volume 9424, 942414 (2015) https://doi.org/10.1117/12.2085645

KEYWORDS: Overlay metrology, Metrology, Target detection, Semiconducting wafers, Optical proximity correction, Resolution enhancement technologies, Reticles, Lithography, Optical lithography, Etching

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