Pedro P. Herrera
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 26 March 2019 Presentation + Paper
Kun Gao, Pedro Herrera, Vidya Ramanathan, Victoria Naipak, Meng Wang, Renan Milo, Tal Yaziv, Nir BenDavid, Chen Dror, Hao Mei, Weihua Li, Xindong Gao, Linfei Gao, Md. Motasim Bellah, Karsten Gutjahr, Dongyue Yang, Cheuk Wun Wong, Xueli Hao, Tony Joung, DeNeil Park, Yue Zhou, Abhishek Gottipati
Proceedings Volume 10959, 1095906 (2019) https://doi.org/10.1117/12.2514548
KEYWORDS: Overlay metrology, Scatterometry, Process control

Proceedings Article | 26 March 2019 Paper
Pedro Herrera, Kun Gao, Chen Dror, Eitan Hajaj, Alon Alexander Volfman, Raviv Yohanan, Vidya Ramanathan, Victoria Naipak, Renan Milo, Tal Yaziv, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Yue Zhou, Abhishek Gottipati
Proceedings Volume 10959, 1095928 (2019) https://doi.org/10.1117/12.2514725
KEYWORDS: Overlay metrology, Metrology, Process control, Semiconducting wafers, Inspection, Optical filters, Polarization, Modeling and simulation, Scatterometry

Proceedings Article | 28 March 2017 Paper
Fang Fang, Pedro Herrera, Taher Kagalwala, Janay Camp, Alok Vaid, Stilian Pandev, Franz Zach
Proceedings Volume 10145, 101452R (2017) https://doi.org/10.1117/12.2261620
KEYWORDS: Metrology, Process control, Critical dimension metrology, Scatterometry, Optical lithography, Scanning electron microscopy, Scanners, Lithography, Etching, Semiconducting wafers, Diffractive optical elements

Proceedings Article | 24 March 2016 Paper
Karsten Gutjahr, Dongsuk Park, Yue Zhou, Winston Cho, Ki Cheol Ahn, Patrick Snow, Richard McGowan, Tal Marciano, Vidya Ramanathan, Pedro Herrera, Tal Itzkovich, Janay Camp, Michael Adel
Proceedings Volume 9778, 97781M (2016) https://doi.org/10.1117/12.2219668
KEYWORDS: Overlay metrology, Semiconducting wafers, Scatterometry, Diffractive optical elements, Metrology, Photovoltaics, Etching, Detection and tracking algorithms, Signal processing, Optical properties

Proceedings Article | 2 April 2014 Paper
Young Ki Kim, Mark Yelverton, John Tristan, Joungchel Lee, Karsten Gutjahr, Ching-Hsiang Hsu, Hong Wei, Lester Wang, Chen Li, Lokesh Subramany, Woong Jae Chung, Jeong Soo Kim, Vidya Ramanathan, LipKong Yap, Jie Gao, Ram Karur-Shanmugam, Anna Golotsvan, Pedro Herrera, Kevin Huang, Bill Pierson
Proceedings Volume 9050, 90501Y (2014) https://doi.org/10.1117/12.2045433
KEYWORDS: Semiconducting wafers, Etching, Lithography, Finite element methods, Scatterometry, Critical dimension metrology, Factory automation, Scanners, High volume manufacturing, Scatter measurement

Showing 5 of 18 publications
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