Dr. Pengzheng Gao Profile

Dr. Pengzheng Gao

at IMECAS

SPIE Involvement:

Author

Publications (5)

SPIE Journal Paper | 21 December 2021

Aberration analysis and compensate method of fully connected neural network in deep ultraviolet lithography

Shuang Zhang, Libin Zhang, Tianyang Gai, Pengzheng Gao, Yayi Wei

OE, Vol. 60, Issue 12, 123105, (December 2021) https://doi.org/10.1117/12.10.1117/1.OE.60.12.123105

KEYWORDS: Lithography, Neural networks, Deep ultraviolet, Data modeling, Source mask optimization, Photomasks, Optical engineering, Zernike polynomials, Machine learning, Image enhancement

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Proceedings Article | 22 February 2021 Poster + Paper

SRAF generation based on SGM/CTM contour line

Pengzheng Gao, Libin Zhang, Ya Yi Wei

Proceedings Volume 11613, 116130R (2021) https://doi.org/10.1117/12.2583694

KEYWORDS: SRAF, Resolution enhancement technologies, Source mask optimization, Optical proximity correction, Model-based design, Image processing, Image quality

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Proceedings Article | 20 March 2019 Paper

Sample patterns extraction from layout automatically based on hierarchical cluster algorithm for lithography process optimization

Tianyang Gai, Ying Chen, Pengzheng Gao, Xiaojing Su, Lisong Dong, Yajuan Su, Yayi Wei, Tianchun Ye

Proceedings Volume 10962, 109620X (2019) https://doi.org/10.1117/12.2514177

KEYWORDS: Feature extraction, Lithography, Optimization (mathematics), Photomasks, Optical proximity correction, Source mask optimization, Machine learning

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Proceedings Article | 20 March 2019 Paper

SRAF rule extraction and insertion based on inverse lithography technology

Xiaojing Su, Pengzheng Gao, Yayi Wei, Weijie Shi

Proceedings Volume 10961, 109610P (2019) https://doi.org/10.1117/12.2511914

KEYWORDS: SRAF, Printing, Optical proximity correction, Lithography, Photomasks, Photovoltaics, Model-based design, Semiconducting wafers, Process modeling, Critical dimension metrology

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Proceedings Article | 3 October 2018 Paper

2D SRAF rule extraction for fast application based on model-based results

Yaoxuan Dai, Xiaojing Su, Pengzheng Gao, Yayi Wei, Yanrong Wang, Jing Zhang, Jiang Yan

Proceedings Volume 10810, 108101E (2018) https://doi.org/10.1117/12.2501455

KEYWORDS: SRAF, Model-based design, Microelectronics, Photomasks, Image classification, Extreme ultraviolet, Manufacturing, Roads, Extreme ultraviolet lithography

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