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Peter Huang
Deputy Director at United Microelectronics Corp
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 4 March 2010 Paper
Wafer LMC accuracy improvement by adding mask model
Wei Cyuan Lo, Yung Feng Cheng, Ming Jui Chen, Peter Haung, Stephen Chang, Eiji Tsujimoto
Proceedings Volume 7640, 76402S (2010) https://doi.org/10.1117/12.846903
KEYWORDS: Photomasks, Semiconducting wafers, Instrument modeling, Printing, Data modeling, Optical proximity correction, Optical lithography, Bridges, Microelectronics, Manufacturing
Proceedings Article | 17 October 2008 Paper
Improving cost of ownership on KLA-Tencor wafer fab reticle inspections by implementing pixel migration via new STARlight2+ capability
Proceedings Volume 7122, 71223J (2008) https://doi.org/10.1117/12.802331
KEYWORDS: Inspection, Photomasks, Reticles, Semiconducting wafers, Air contamination, Wafer inspection, Metals, Microelectronics, Data processing, Image processing
Proceedings Article | 8 November 2005 Paper
Study of effects of sidewall angle on process window using 193nm CPL masks in a 300mm wafer manufacturing environment
Yung Feng Cheng, Yueh Lin Chou, C. Lin, Peter Huang
Proceedings Volume 5992, 59922R (2005) https://doi.org/10.1117/12.631079
KEYWORDS: Photomasks, Semiconducting wafers, 3D metrology, 3D printing, Printing, 193nm lithography, Lithography, Wafer manufacturing, Atomic force microscopy
Proceedings Article | 27 December 2002 Paper
Characterization of repairs to KrF 300-mm wafer printability for 0.13-um design rule with attenuated phase-shifting mask
William Chou, Tsung Chen, Will Tseng, Peter Huang, Chin Tseng, Mars Chung, Dick Wang, Norman Huang
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467314
KEYWORDS: Photomasks, Semiconducting wafers, Quartz, Reticles, Inspection, Lithography, Critical dimension metrology, Image processing, Phase shifting, Scanning electron microscopy
Proceedings Article | 5 July 2000 Paper
Comparison between 2-phase-shifting mask and 3-phase-shifting mask on application of printing low-duty-ratio contact array patterning
Kuei-Chun Hung, Benjamin Lin, Hsien-an Chang, Alex Tseng, Lien-Sheng Chung, WeiJyh Liu, Der-Yuan Wu, Peter Huang
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388974
KEYWORDS: Distortion, Printing, Optical lithography, Photomasks, Scattering, Etching, Phase shifts, Critical dimension metrology, Photoresist materials, Scanning electron microscopy
Conference Committee Involvement (3)
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
SPIE Lithography Asia - Taiwan
18 November 2009 | Taipei, Taiwan
SPIE Lithography Asia - Taiwan
4 November 2008 | Taipei, Taiwan
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