Mr. Peter Ledel Profile

Peter Ledel

at EV Group

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 25 May 2022 Presentation + Paper

Wafer scale nanoimprint lithography: distortion improvement and stabilization

Jerome Reche, Maxime Argoud, Anaïs De Lehelle D'Affroux, Haidar Al Dujaili, Jonas Khan, Sebastian Haumann, Peter Ledel, Martin Eibelhuber

Proceedings Volume 12054, 1205404 (2022) https://doi.org/10.1117/12.2613788

KEYWORDS: Distortion, Semiconducting wafers, Nanoimprint lithography, Overlay metrology, Standards development, Lithography, Data modeling

Read Abstract +

NanoImprint Lithography (NIL) is not a novel technology anymore1 but huge progress has been achieved for its industrial introduction since its first reporting. One of the main evolutions concerns the use soft stamp media2 ,which is now a standard technology. EVG introduced this technology with a full wafer imprint solution (the size of the stamp corresponds to the size of the wafer to print)3 and results obtained since five years are at the state of the art. Repeatability, uniformity, sub-50nm resolution and high aspect ratio patterns are addressed at the same time4–6 . Nevertheless, some challenges still remain, as e.g overlay7 and in particular the distortion phenomenona 8 , which contribute to the remaining overlay next to global translation and rotation. This study is focused on distortion effect which appears during NIL process using flexible backplanes and its minimization by using different materials. A polymer backplane is compared with a glass backplane which are used as carrier to the soft stamp material. A dedicated methodology to precisely measure this distortion is implemented to remove global alignment signature. Distortion signature is firstly evaluated with a standard soft stamp material and process of reference already established. Distortion fingerprint mapping is obtained for each wafer. Thanks to this mapping, a monitoring distortion plot is extracted, in order to follow the evolution of the distortion depending on wafers (wafer-to-wafer) and lots (lot-tolot). This study highlights that the use of a glass backplane developed by EVG clearly allows to improve the distortion in terms of magnitude but also of stability.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years