Dr. Qi Lin Profile

Dr. Qi Lin

Senior Staff Process Engineer at Advanced Micro Devices Inc

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Publications (4)

Proceedings Article | 26 May 2022 Presentation + Paper

EUV and immersion lithography integration in 7nm FPGA production

Qi Lin, Nui Chong, Toshiyuki Hisamura, Jonathan Chang

Proceedings Volume 12051, 120510G (2022) https://doi.org/10.1117/12.2614366

KEYWORDS: Extreme ultraviolet, Photomasks, Semiconducting wafers, Metals, Extreme ultraviolet lithography, Optical lithography, Critical dimension metrology, Immersion lithography, Resistance, Field programmable gate arrays

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Proceedings Article | 22 February 2021 Presentation + Paper

Optimization of the EUV contact layer process for 7nm FPGA production

Qi Lin, Toshiyuki Hisamura, Nui Chong, Jonathan Chang

Proceedings Volume 11609, 116090V (2021) https://doi.org/10.1117/12.2584288

KEYWORDS: Extreme ultraviolet, Field programmable gate arrays, Resistance, Extreme ultraviolet lithography, Transistors, Immersion lithography

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Proceedings Article | 23 March 2020 Presentation + Paper

Improvement of SADP CD control in 7nm BEOL application

Qi Lin, Toshiyuki Hisamura, Nui Chong, Jonathan Chang

Proceedings Volume 11327, 113270X (2020) https://doi.org/10.1117/12.2552168

KEYWORDS: Metals, Critical dimension metrology, Semiconducting wafers, Silicon, Resistance, Etching, Back end of line, Photomasks, Double patterning technology, Lithography

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Proceedings Article | 16 September 2014 Paper

Double-patterning optimization in 20nm SRAM design

Qi Lin, Toshiyuki Hisamura, Nui Chong, Hans Pan, Yun Wu, Jonathan Chang, Xin Wu

Proceedings Volume 9235, 923505 (2014) https://doi.org/10.1117/12.2066262

KEYWORDS: Double patterning technology, Diffusion, Photomasks, Optical proximity correction, Critical dimension metrology, Silicon, Field programmable gate arrays, Semiconducting wafers, Optical lithography, Optical alignment

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