Dr. Rex B. Anderson Profile

Dr. Rex B. Anderson

Research Engineer at Micross Components Inc

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Publications (7)

Proceedings Article | 17 December 2003 Paper

Optimization of a 65-nm alternating phase-shift quartz etch process

Scott Anderson, Rex Anderson, Melisa Buie, Madhavi Chandrachood, Jason Clevenger, Yvette Lee, Nicole Sandlin, Jian Ding

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518231

KEYWORDS: Etching, Reactive ion etching, Photomasks, Quartz, Ions, Phase measurement, Plasma, Phase shifts, Diffractive optical elements, Statistical analysis

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Proceedings Article | 17 December 2003 Paper

Optimization of chrome dry etch in Tetra II using asymmetrically loaded patterns

Cynthia Brooks, Rex Anderson, Jason Clevenger, Corey Collard, Monika Halim, Turgut Sahin, Alfred Mak

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.519625

KEYWORDS: Etching, Critical dimension metrology, Photomasks, Reticles, Data modeling, Semiconducting wafers, Prototyping, Dry etching, Diffractive optical elements, Chlorine

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Proceedings Article | 17 December 2003 Paper

Examination of various endpoint methods for chrome mask etch

Corey Collard, Scott Anderson, Rex Anderson, Jason Clevenger, Monika Halim, Cynthia Brooks, Melisa Buie, Turgut Sahin

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.519188

KEYWORDS: Principal component analysis, Etching, Signal to noise ratio, Chromium, Calibration, Spectroscopy, Photomasks, Charge-coupled devices, Photoresist processing, Neural networks

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Proceedings Article | 28 August 2003 Paper

Improvement of chrome CDU by optimizing focus ring design

Rex Anderson, Guenther Ruhl, Pavel Nesladek, Gerhard Prechtl, Winfried Sabisch, Alfred Kersch, Melisa Buie

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504199

KEYWORDS: Etching, Chlorine, Critical dimension metrology, Oxygen, Photomasks, Plasma etching, Plasma, Data centers, Chromium, Manufacturing

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Proceedings Article | 28 May 2003 Paper

Optical emission endpoint optimization in the tetra etch chamber for production of embedded phase-shift photomasks

Cynthia Brooks, Scott Anderson, Rex Anderson, Corey Collard, Jason Clevenger, Nicole Sandlin, Melisa Buie

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515073

KEYWORDS: Etching, Photomasks, Molybdenum, Phase shifts, Quartz, Fluorine, Chemistry, Optical lithography, Emission spectroscopy, Phase measurement

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Proceedings Article | 27 December 2002 Paper

Study of the role of Cl2, O2, and He in the chrome etch process with optical emission spectroscopy

Rex Anderson, Guenther Ruhl, Nicole Sandlin, Melisa Buie

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467849

KEYWORDS: Etching, Chlorine, Chromium, Plasma, Oxygen, Plasma etching, Emission spectroscopy, Carbon monoxide, Photomasks, Scanning electron microscopy

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Proceedings Article | 1 August 2002 Paper

In-situ optical emission spectroscopic examination of chrome etch for photomasks

Rex Anderson, Nicole Sandlin, Melisa Buie, Clyde Su, Ashish Agarwal, Cynthia Brooks, Yi-Chiau Huang, Brigitte Stoehr

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476993

KEYWORDS: Etching, Plasma, Principal component analysis, Chlorine, Photomasks, Plasma etching, Emission spectroscopy, Spectroscopy, Electrons, Chromium

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Showing 5 of 7 publications

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