Mr. Richard J. Markle Profile

Richard J. Markle

at Advanced Micro Devices Inc

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 1 July 2003 Paper

Cost and revenue impact of advanced process control (APC) with an emphasis on run-to-run control (R2R)

Timothy Stanley, Richard Markle, Brad Van Eck, Brian Cusson, Matthew Purdy, K. Stanley

Proceedings Volume 5044, (2003) https://doi.org/10.1117/12.485316

KEYWORDS: Semiconducting wafers, Chemical mechanical planarization, Process control, Manufacturing, Semiconductors, Semiconductor manufacturing, Diffusion, Metrology, Copper, Logic

Read Abstract +

Proceedings Article | 12 July 2002 Paper

Wafer-level fault detection and classification on a photo track in a high volume fab

Timothy Jackson, Richard Markle, Clinton Miller, Edward Stewart, Robert Crowell

Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475649

KEYWORDS: Semiconducting wafers, Control systems, Sensors, Semiconductors, Manufacturing, Data acquisition, Optical inspection, Scanning electron microscopy, High volume manufacturing, Metrology

Read Abstract +

Proceedings Article | 22 August 2001 Paper

Scatterometry for shallow trench isolation (STI) process metrology

Christopher Raymond, Michael Littau, Richard Markle, Matthew Purdy

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436798

KEYWORDS: Semiconducting wafers, Etching, Scatterometry, Scanning electron microscopy, Scatter measurement, Silicon, Atomic force microscopy, Metrology, Light scattering, Diffraction

Read Abstract +

Proceedings Article | 25 August 1997 Paper

Modeling of OES data to estimate etch rate for etching equipment

Yi Cheng, Richard Markle, Joe Qin, Thomas Edgar, Michael Gatto, Chris Nauert

Proceedings Volume 3213, (1997) https://doi.org/10.1117/12.284627

KEYWORDS: Etching, Data modeling, Statistical modeling, Semiconducting wafers, Sensors, Oxides, Performance modeling, Data analysis, Solids, Chemical analysis

Read Abstract +

Conference Committee Involvement (1)

Process and Materials Characterization and Diagnostics in IC Manufacturing II

27 February 2003 | Santa Clara, CA, United States

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years