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Rina Azuma
at Univ of Aizu
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Publications (1)
Proceedings Article | 23 March 2020 Presentation + Paper
Process variation-aware mask optimization with iterative improvement by subgradient method and boundary flipping
Rina Azuma, Yukihide Kohira, Tomomi Matsui, Atsushi Takahashi, Chikaaki Kodama
Proceedings Volume 11328, 113280O (2020) https://doi.org/10.1117/12.2552514
KEYWORDS: Photomasks, Image processing, Source mask optimization, Optical proximity correction, Mathematical modeling, Model-based design, Lithography, SRAF, System on a chip, Resolution enhancement technologies
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