Dr. Robert R. Hershey Profile

Dr. Robert R. Hershey

Director of Marketing and Business Development at Canon Nanotechnologies Inc

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Author

Publications (13)

Proceedings Article | 12 September 2006 Paper

2D photonic crystal patterning for high-volume LED manufacturing

Rob Hershey, Mike Miller, Chris Jones, Mahadevan Ganapathi Subramanian, Xiaoming Lu, Gary Doyle, David Lentz, Dwayne LaBrake

Proceedings Volume 6337, 63370M (2006) https://doi.org/10.1117/12.681481

KEYWORDS: Semiconducting wafers, Light emitting diodes, Photonic crystals, Manufacturing, Etching, Photomasks, Electron beam lithography, Particles, Quartz, Lithography

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Proceedings Article | 22 August 2001 Paper

Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization

John Allgair, David Benoit, Mark Drew, Robert Hershey, Lloyd Litt, Pedro Herrera, Umar Whitney, Marco Guevremont, Ady Levy, Suresh Lakkapragada

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436771

KEYWORDS: Single crystal X-ray diffraction, Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Process control, Spectroscopy, Spectroscopes, Metrology, Precision measurement, Control systems

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Proceedings Article | 2 June 2000 Paper

Manufacturing considerations for implementation of scatterometry for process monitoring

John Allgair, David Benoit, Robert Hershey, Lloyd Litt, Ibrahim Abdulhalim, William Braymer, Michael Faeyrman, John Robinson, Umar Whitney, Yiping Xu, Piotr Zalicki, Joel Seligson

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386465

KEYWORDS: Scatterometry, Reflectivity, Scanning electron microscopy, Critical dimension metrology, Metrology, Silicon, Atomic force microscopy, Manufacturing, Process control, Semiconducting wafers

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Proceedings Article | 26 July 1999 Paper

Characterization of CD control for sub-0.18-um lithographic patterning

John Sturtevant, John Allgair, Chong-Cheng Fu, Kent Green, Robert Hershey, Michael Kling, Lloyd Litt, Kevin Lucas, Bernard Roman, Gary Seligman, Mike Schippers

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354335

KEYWORDS: Critical dimension metrology, Error analysis, Optical lithography, Semiconducting wafers, Reticles, Metrology, Deep ultraviolet, Lithography, Reflectivity, Resistance

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Proceedings Article | 8 June 1998 Paper

Implementation of a closed-loop CD and overlay controller for sub-0.25-um patterning

John Sturtevant, Michele Weilemann, Kent Green, John Dwyer, Eric Robertson, Robert Hershey

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308788

KEYWORDS: Critical dimension metrology, Overlay metrology, Lithography, Control systems, Deep ultraviolet, Manufacturing, Etching, Optical lithography, Semiconducting wafers, Scanners

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Proceedings Article | 7 July 1997 Paper

Full-field CD control for sub-0.20-um patterning

John Sturtevant, John Allgair, Mark Barrick, Chong-Cheng Fu, Kent Green, Robert Hershey, Lloyd Litt, John Maltabes, Carla Nelson-Thomas, Bernard Roman, John Singelyn

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276024

KEYWORDS: Critical dimension metrology, Deep ultraviolet, Optical lithography, Lithography, Resistance, Manufacturing, Logic

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Proceedings Article | 22 May 1995 Paper

Cycle-time reduction of CD targeting using automated metrology and analysis

Richard Elliott, Robert Hershey, Kevin Kemp

Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209214

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Lithography, Etching, Metrology, Data modeling, Scanning electron microscopy, Statistical analysis, Cadmium, Photoresist materials

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Proceedings Article | 22 May 1995 Paper

Procedure for evaluating measurement system performance: a case study

Robert Hershey, Richard Elliott

Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209221

KEYWORDS: Semiconducting wafers, Manufacturing, Scanning electron microscopy, Metrology, Critical dimension metrology, Human-machine interfaces, Process control, Image resolution, Inspection, Pattern recognition

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Proceedings Article | 1 May 1994 Paper

Diagnostic monitoring procedure for automated measurement systems

Robert Hershey, Richard Elliott

Proceedings Volume 2196, (1994) https://doi.org/10.1117/12.174133

KEYWORDS: Diagnostics, Metrology, Data analysis, Error analysis, Scanning electron microscopy, Electron microscopes, Semiconductor manufacturing

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Proceedings Article | 4 August 1993 Paper

Nonlinearity in scanning electron microscope critical dimension measurements introduced by the edge detection algorithm

Robert Hershey, Michael Weller

Proceedings Volume 1926, (1993) https://doi.org/10.1117/12.148943

KEYWORDS: Edge detection, Detection and tracking algorithms, Scanning electron microscopy, Signal processing, Algorithm development, Electron microscopes, Signal detection, Photomicroscopy, Algorithms, Nonlinear optics

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Proceedings Article | 1 June 1992 Paper

Expert system for performing measurement system characterization

Robert Hershey, Terrence Zavecz

Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59815

KEYWORDS: Calibration, Statistical analysis, Metrology, Error analysis, Inspection, Integrated circuits, Process control, Time metrology, Scanning electron microscopy, Polonium

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Proceedings Article | 1 July 1991 Paper

Figure of merit for calibration and comparison of linewidth measurement instruments

Robert Hershey, Terrence Zavecz

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44421

KEYWORDS: Calibration, Error analysis, Statistical analysis, Metrology, Integrated circuits, Inspection, Process control, Data modeling, Information operations, Head

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Proceedings Article | 1 May 1990 Paper

Techniques for high-quality fringe generation

Emmett Leith, Robert Hershey, Hsuan Chen

Proceedings Volume 1211, (1990) https://doi.org/10.1117/12.17935

KEYWORDS: Interferometers, Collimation, Diffraction gratings, Holography, Beam splitters, Collimators, Wavefronts, Signal to noise ratio, Fringe analysis, Spherical lenses

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Showing 5 of 13 publications

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