Ms. Roswitha Remling Profile

Roswitha Remling

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 19 July 2000 Paper

Current status of 157-nm mask technology development

Giang Dao, Ronald Kuse, Kevin Orvek, Eric Panning, Roswitha Remling, Jun-Fei Zheng, Munehiko Tsubosaki, Fu-Chang Lo

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392091

KEYWORDS: Photomasks, Reticles, Pellicles, Silica, Lithography, Contamination, Chromium, Manufacturing, Semiconducting wafers, Transmittance

Read Abstract +

Proceedings Article | 12 February 1997 Paper

Focused ion beam repair of 193-nm reticle at 0.18-um design rules

Pei-yang Yan, Roswitha Remling

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301191

KEYWORDS: Photomasks, Semiconducting wafers, Ion beams, Critical dimension metrology, Scanning electron microscopy, Reticles, Carbon, Manufacturing, Gallium, Solids

Read Abstract +

Proceedings Article | 7 December 1994 Paper

Focused ion beam phase-shift mask repair (fib or fact?)

Roswitha Remling

Proceedings Volume 2322, (1994) https://doi.org/10.1117/12.195824

KEYWORDS: Quartz, Ion beams, Opacity, Photomasks, Phase shifts, Carbon, Photomask technology, Multiplexers, Atomic force microscopy, Ions

Read Abstract +

Proceedings Article | 15 February 1994 Paper

PSM defect repair using currently available tools

Roswitha Remling

Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167266

KEYWORDS: Chromium, Quartz, Photomasks, Etching, Carbon, Laser systems engineering, Photomask technology, Semiconducting wafers, Phase shifts, Manufacturing

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years