Dr. Ruiqi Tian Profile

Dr. Ruiqi Tian

at NXP Semiconductors

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 6 December 2004 Paper

A multi-objective floorplanner for shuttle mask optimization

Gang Xu, Ruiqi Tian, David Pan, Martin Wong

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569345

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Reticles, Manufacturing, Chemical mechanical planarization, Algorithms, Very large scale integration, Wafer manufacturing, Computer programming

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Proceedings Article | 28 May 2004 Paper

Cost of ownership reduction for OPC development and production

Chi-Min Yuan, Bob Jarvis, Kevin Lucas, Robert Boone, Ruiqi Tian, Alfred Reich

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535279

KEYWORDS: Optical proximity correction, Optical lithography, Lithography

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Proceedings Article | 3 May 2004 Paper

Combining OPC and design for printability into 65-nm logic designs

Kevin Lucas, Chi-Min Yuan, Robert Boone, Kirk Strozewski, Jason Porter, Ruiqi Tian, Karl Wimmer, Jonathan Cobb, Bill Wilkinson, Olivier Toublan

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.537655

KEYWORDS: Reticles, Optical proximity correction, Design for manufacturing, Lithography, Logic, Model-based design, Metals, Manufacturing, Optical lithography, Yield improvement

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Proceedings Article | 17 December 2003 Paper

Shuttle mask floorplanning

Gang Xu, Ruiqi Tian, Martin Wong, Alfred Reich

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517568

KEYWORDS: Photomasks, Mirrors, Inspection, Algorithms, Semiconducting wafers, Space mirrors, Wafer manufacturing, Manufacturing, Very large scale integration, Computer aided design

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Proceedings Article | 12 July 2002 Paper

Implications of tiling for performance and design flow

Ertugrul Demircan, Ruiqi Tian, Warren Grobman

Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475690

KEYWORDS: Capacitance, Copper, Chemical mechanical planarization, Metals, Model-based design, Polishing, Calibration, Resistance, Oxides, Electromagnetism

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Proceedings Article | 26 July 1999 Paper

Practicing extension of 248-nm DUV optical lithography using trim-mask PSM

Michael Kling, Nigel Cave, Bradley Falch, Chong-Cheng Fu, Kent Green, Kevin Lucas, Bernard Roman, Alfred Reich, John Sturtevant, Ruiqi Tian, Drew Russell, Linard Karklin, Yao-Ting Wang

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354297

KEYWORDS: Photomasks, Binary data, Reticles, Deep ultraviolet, Optical proximity correction, Optical lithography, Optics manufacturing, Manufacturing, Etching, Phase shifts

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Showing 5 of 6 publications

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