Mr. Ryo Tanaka Profile

Ryo Tanaka

at Nikon Corp

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Author

Publications (4)

Proceedings Article | 10 March 2010 Paper

Double patterning lithography study with high overlay accuracy

Takahisa Kikuchi, Yosuke Shirata, Masahiko Yasuda, Yasuhiro Iriuchijima, Kengo Takemasa, Ryo Tanaka, Andrew Hazelton, Yuuki Ishii

Proceedings Volume 7640, 76400H (2010) https://doi.org/10.1117/12.846486

KEYWORDS: Double patterning technology, Lithography, Optical lithography, Semiconducting wafers, Photoresist processing, Scanning electron microscopy, Immersion lithography, Scanners, Glasses, Overlay metrology

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Proceedings Article | 1 April 2009 Paper

Fine trench patterns with double patterning and trench shrink technology

Satoru Shimura, Masato Kushibiki, Tetsu Kawasaki, Ryo Tanaka, Akira Tokui, Yuuki Ishii

Proceedings Volume 7273, 72730A (2009) https://doi.org/10.1117/12.814097

KEYWORDS: Double patterning technology, Lithography, Etching, Semiconducting wafers, Reflectivity, Chemical vapor deposition, 193nm lithography, Tin, Semiconductors, Silica

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Proceedings Article | 16 March 2009 Paper

Immersion-cluster uptime enhancement technology toward high-volume manufacturing

R. Tanaka, T. Fujiwara, K. Nakano, S. Wakamizu, H. Kyouda

Proceedings Volume 7274, 72743M (2009) https://doi.org/10.1117/12.814112

KEYWORDS: Contamination, Semiconducting wafers, Particles, Bridges, Thin film coatings, High volume manufacturing, Coating, Immersion lithography, Process control, Image filtering

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Proceedings Article | 28 May 2004 Paper

TTR (through the reticle) alignment system with photoresist ablation technique

Ryo Tanaka, Mitsuru Kobayashi, Masahiko Yasuda, Nobutaka Magome, Kazuhiko Ishigo, Hiroshi Ikegami, Tatsuhiko Higashiki

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544231

KEYWORDS: Optical alignment, Semiconducting wafers, Laser ablation, Reticles, Opacity, Signal detection, Absorption, Silicon, Q switching, YAG lasers

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