Dr. Samoto Norihiko Profile

Dr. Samoto Norihiko

at JEOL (UK) Ltd

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 25 May 2010 Paper

Monitor technology of outer circumstances for mask EB writing system

H. Hoshi, N. Samoto, H. Manabe, O. Wakimoto, S. Iida, M. Yamabe

Proceedings Volume 7748, 774817 (2010) https://doi.org/10.1117/12.864043

KEYWORDS: Photomasks, Diagnostics, System integration, Magnetism, Data processing, Inspection, Reliability, Electronics, Manufacturing, Environmental sensing

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Proceedings Article | 3 April 2010 Paper

Monitor and self-diagnostic technology for mask e-beam writing system

N. Samoto, H. Manabe, O. Wakimoto, S. Iida, H. Hoshi, M. Yamabe

Proceedings Volume 7637, 76371K (2010) https://doi.org/10.1117/12.846266

KEYWORDS: Photomasks, Diagnostics, System integration, Amplifiers, Magnetism, Inspection, Data processing, Signal detection, Electronics, Error analysis

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Proceedings Article | 11 May 2009 Paper

Improvement of data transfer speed and development of an EB data verification system in a VSB mask writer

Osamu Wakimoto, Hironobu Manabe, Hiromichi Hoshi, Norihiko Samoto, Tadashi Komagata, Yasutoshi Nakagawa, Masaki Yamabe

Proceedings Volume 7379, 73791Z (2009) https://doi.org/10.1117/12.824312

KEYWORDS: Photomasks, Data processing, Lithography, Computing systems, Reliability, Data storage, Resolution enhancement technologies, Digital recording, Optical proximity correction, Control systems

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Proceedings Article | 18 March 2009 Paper

Monitor and self-diagnostic technology for mask e-beam writing system

Norihiko Samoto, Hironobu Manabe, Osamu Wakimoto, Satoshi Iida, Hiromichi Hoshi, Masaki Yamabe

Proceedings Volume 7271, 72712R (2009) https://doi.org/10.1117/12.813360

KEYWORDS: Photomasks, Data processing, Amplifiers, Diagnostics, Inspection, Environmental monitoring, System integration, Signal detection, Reliability, Analog electronics

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SPIE Journal Paper | 1 April 2005

Low energy electron beam proximity projection lithography

Norihiko Samoto, Akira Yoshida, Hideaki Takano, Akihiro Endo, Toyoji Fukui

JM3, Vol. 4, Issue 02, 023008, (April 2005) https://doi.org/10.1117/12.10.1117/1.1898063

KEYWORDS: Photomasks, Semiconducting wafers, Charged-particle lithography, Electron beams, Optical alignment, Distortion, Electron beam lithography, Wafer-level optics, Projection lithography, Scanners

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Proceedings Article | 20 May 2004 Paper

LEEPL production tool: EBPrinter LEEPL-3000

Norihiko Samoto, Hideaki Takano, Akihiro Endo, Akira Yoshida, Toyoji Fukui

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535109

KEYWORDS: Photomasks, Semiconducting wafers, Charged-particle lithography, Optical alignment, Electron beams, Lithography, Scanners, Data corrections, Electron beam lithography, Distortion

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Proceedings Article | 7 July 1997 Paper

Deblocking reaction of chemically amplified positive DUV resists

Mitsuharu Yamana, Toshiro Itani, Hiroshi Yoshino, Shuichi Hashimoto, Norihiko Samoto, Kunihiko Kasama

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275829

KEYWORDS: Diffusion, Lithography, Deep ultraviolet, Chemically amplified resists, Chemical analysis, Air contamination, Silicon, Statistical analysis, Absorption, Beryllium

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Proceedings Article | 7 July 1997 Paper

Acid evaporation property in chemically amplified resists

Shuichi Hashimoto, Toshiro Itani, Hiroshi Yoshino, Mitsuharu Yamana, Norihiko Samoto, Kunihiko Kasama

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275827

KEYWORDS: Diffusion, Electroluminescence, Absorbance, Chemically amplified resists, Lithography, Semiconducting wafers, Absorption, Ions, Scanning electron microscopy, Deep ultraviolet

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The lithographic performance of a chemically amplified resist system very much depends on the photo-generated acid structure. In a previous paper, we reported the molecular structure dependence of two typical photo-generated acids (aromatic sulfonic acid and alkyl sulfonic acid) from the viewpoints of lithographic performance and acid characteristics such as acid generation efficiency, acid diffusion behavior and acid evaporation property. In this paper, we evaluate the effect of the remaining solvent in a resist film on the acid evaporation property. Four types of two-component chemically amplified positive KrF resists were prepared consisting of tert-butoxycarbonyl (t-BOC) protected polyhydroxystyrene and sulfonic acid derivative photo-acid generator (PAG). Here, a different combination of two types of PAGs [2,4-dimethylbenzenesulfonic acid (aromatic sulfonic acid) derivative PAG and cyclohexanesulfonic acid (alkyl sulfonic acid) derivative PAG] and two types of solvents (propylene glycol monomethyl ether acetate; PGMEA and ethyl lactate; EL) were evaluated. The aromatic sulfonic acid was able to evaporate easily during post exposure bake (PEB) treatment, but the alkyl sulfonic acid was not. The higher evaporation property of aromatic sulfonic acid might be due to the higher vapor pressure and the longer acid diffusion length. Furthermore, the amount of aromatic sulfonic acid in the PGMEA resist was reduced by more than that in the EL resist. The amount of acid loss also became smaller at a higher prebake temperature. The concentration of the remaining solvent in the resist film decreased with the increasing prebake temperature. We think that the acid evaporation property was affected by the remaining solvent in the resist, film; the large amount of remaining solvent promoted the acid diffusion and eventually accelerated the acid evaporation from the resist film surface in the PGMEA resist. In summary, the acid evaporation property depends on both the acid structure and the remaining solvent in the resist film. These results can be applied to other chemically amplified resist systems to suppress the T-topping profile and achieve a superior resist performance.

Proceedings Article | 14 June 1996 Paper

Halation reduction for single-layer DUV resist processing

Hiroshi Yoshino, Toshiro Itani, Shuichi Hashimoto, Mitsuharu Yamana, Norihiko Samoto, Kunihiko Kasama

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241819

KEYWORDS: Transmittance, Photoresist processing, Deep ultraviolet, Lithography, Excimer lasers, Reflectivity, Critical dimension metrology, Absorption, Chlorine, Optical lithography

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Showing 5 of 9 publications

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