Mr. Sangho Lee Profile

Sangho Lee

Executive Vice President at Kyungin Synthetic Corporation

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Author

Publications (8)

Proceedings Article | 4 May 2005 Paper

Effect of hard bake process on LER

Munirathna Padmanaban, David Rentkiewicz, SangHo Lee, Chisun Hong, Dongkwan Lee, Dalil Rahman, Raj Sakamuri, Ralph Dammel

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.604401

KEYWORDS: Line edge roughness, Photoresist processing, Polymers, Line width roughness, Semiconducting wafers, Critical dimension metrology, Cadmium, Chemically amplified resists, Transistors, Optical lithography

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Proceedings Article | 14 May 2004 Paper

PEB sensitivity studies of ArF resists: II. Polymer and solvent effects

Chi-Sun Hong, Sang-Ho Lee, Woo-Kyu Kim, Takanori Kudo, Allen Timko, Douglas Mckenzie, Clement Anyadiegwu, Dalil Rahman, Guanyang Lin, Ralph Dammel, Munirathna Padmanaban

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537931

KEYWORDS: Polymers, Critical dimension metrology, Photoresist processing, Etching, Resistance, Lithography, Semiconducting wafers, Resist chemistry, Line edge roughness, Dry etching

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Proceedings Article | 12 June 2003 Paper

PEB sensitivity studies of ArF resist

SangHo Lee, Woo-Kyu Kim, Dalil Rahman, Takanori Kudo, Allen Timko, Clement Anyadiegwu, Douglas McKenzie, Takashi Kanda, Ralph Dammel, Munirathna Padmanaban

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485183

KEYWORDS: Lithography, Critical dimension metrology, Line edge roughness, Polymers, Photoresist processing, Semiconducting wafers, Coating, Rutherfordium, Diffusion, Scanning electron microscopy

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Proceedings Article | 12 June 2003 Paper

Performance of imide and methide onium PAGs in 193-nm resist formulations

Munirathna Padmanaban, Ralph Dammel, SangHo Lee, Woo-Kyu Kim, Takanori Kudo, Douglas McKenzie, Dalil Rahman

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.487738

KEYWORDS: Polymers, Lithography, 193nm lithography, Semiconducting wafers, Argon, Chemically amplified resists, Fluorine, Diffusion, Cadmium sulfide, Etching

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Proceedings Article | 24 July 2002 Paper

Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists

Takanori Kudo, Eric Alemy, Ralph Dammel, Woo-Kyu Kim, Sang-Ho Lee, Seiya Masuda, Douglas McKenzie, Dalil Rahman, Andrew Romano, Munirathna Padmanaban, Jun-Sung Chun, Jae Chang Jung, Sung-Koo Lee, Ki-Soo Shin, Hyeong-Soo Kim

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474214

KEYWORDS: Photomasks, Polymers, Lithography, Binary data, Diffusion, Scanning electron microscopy, Halftones, Photoresist processing, Coherence (optics), Monochromatic aberrations

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Proceedings Article | 24 July 2002 Paper

E-beam curing effects on the etch and CD-SEM stability of 193-nm resists

Munirathna Padmanaban, Eric Alemy, Ralph Dammel, Woo-Kyu Kim, Takanori Kudo, Sang-Ho Lee, Douglas McKenzie, Aldo Orsi, Dalil Rahman, Wan-Lin Chen, Reza Sadjadi, William Livesay, Matthew Ross

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474262

KEYWORDS: Etching, Photoresist processing, Scanning electron microscopy, Surface roughness, FT-IR spectroscopy, Electron beams, Semiconducting wafers, Polymers, Chemistry, Oxides

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Proceedings Article | 24 July 2002 Paper

Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography

Ralph Dammel, Raj Sakamuri, Sang-Ho Lee, Dalil Rahman, Takanori Kudo, Andrew Romano, Larry Rhodes, John-Henry Lipian, Cheryl Hacker, Dennis Barnes

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474196

KEYWORDS: Polymers, Lithography, Absorbance, Photoresist materials, Polymerization, Transparency, Glasses, Binary data, Photomasks, Dry etching

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Proceedings Article | 24 July 2002 Paper

High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

Dalil Rahman, Eric Alemy, Will Conley, Daniel Miller, Ralph Dammel, Woo-Kyu Kim, Takanori Kudo, Sang-Ho Lee, Seiya Masuda, Douglas McKenzie, Munirathna Padmanaban

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474210

KEYWORDS: Polymers, Lithography, Line edge roughness, Photomasks, Semiconducting wafers, Lithographic illumination, Photoresist processing, Binary data, Fourier transforms, Etching

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Showing 5 of 8 publications

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