It is extremely important to reduce CO2 in the world and to achieve carbon neutral. Various bio-based green materials
using biomass made from plants/woods are proposed for achieving carbon neutral. This paper describes biomass
developer solvent made from plants for lithography application. CO2 is markedly reduced, and it is reported reusing of
the biomass developer after development process.
One of technical issues of directed self-assembly lithography is extremely narrow patterning range. It is really difficult to make not only smaller patterns (pitch of less than 30nm) because of self-assembling limit but also middle patterns (pitch of more than 60nm) because of material synthesis issues. This paper describes wide–range directed self-assembly lithography which enables not only narrow patterns but also wide patterns using newly developed block copolymer. One block of the new block copolymer is easily metalized selectively by metalize technology and it is confirmed that dry etching resistance is markedly improved.
In next generation lithography to make sub-15nm pattern, Directed self-assembly (DSA) and Nano-imprint lithography (NIL) are proposed. The current DSA process is complicated and it is difficult to decrease width and line edge roughness of a guide pattern for sub-15nm patterning. In the case of NIL, it is difficult to make the master template having sub- 15nm pattern. This paper describes cost-effective lithography process for making sub-15nm pattern using DSA on a guide pattern replicated by Nano-imprinting (NIL + DSA). Simple process for making sub-15nm pattern is proposed. The quartz templates are made and line/space patterns of half pitch (hp) 12nm and hp9.5nm are obtained by NIL + DSA.
KEYWORDS: Polymethylmethacrylate, Picosecond phenomena, Transmission electron microscopy, Calibration, Process modeling, Computer simulations, Optimization (mathematics), System on a chip, Image processing, Directed self assembly
Application of the directed self-assembly of block copolymer to the hole shrink process has gained large attention because of the low cost and high potential for sublithographic patterning. In this study, we have employed a simplified model, called the Ohta-Kawasaki model to find the optimal process conditions, which minimize the morphological defects of the diblock copolymer, PS-b-PMMA. The model parameters were calibrated with cross-sectional transmission electron microscopy images. Our simulation results revealed that it is difficult to eliminate the morphological defects (i.e., PS residual layer) by only varying the shape of the guide hole. It turned out that changing the affinity of the bottom surface of the guide hole from “PMMA attractive” to “neutral” is a more effective way to obtain a reasonably wide, defect-free process window. Note that our simulations are not only computationally inexpensive, but are also comparable to the other detailed models such as the self-consistent field theory; they may also be feasible for large-scale simulations such as the hotspot analysis over a large area.
For sub-10nm lithography for semiconductor devices, inspection technologies for detecting nanometer size defects become quite important. In the case of optical inspection, it is difficult to detect a defect whose size is less than 23nm because of optical resolution limit. This paper describes a cost-effective inspection technology for detecting a nanometer size defect with the optical inspection technology using replicated soft template which is able to enlarge a defect size by expanding. Feasibility of detecting 9.6nm defect with optical inspection is reported.
For making sub-10nm patterns, new lithography technology is proposed in this paper. This is a cost-effective new lithography process using the special organic material which is able to reduce a pattern size by shrinking. Shrinking ratio of various methods, decreasing line edge roughness (LER) and patterning of less than 10nm half pitch size are reported.
KEYWORDS: Polymethylmethacrylate, Picosecond phenomena, Calibration, 3D modeling, Transmission electron microscopy, System on a chip, Data modeling, Computer simulations, Design for manufacturing, Directed self assembly
Application of the directed self-assembly (DSA) of block copolymer (PS-b-PMMA) to the hole shrink process has gained large attention because of the low cost and the potential for sub-lithographic patterning of contact, via and cut masks (Ref. [1-2] and references therein). In order to realize the DSA hole shrink process for manufacturing, however, one still has to resolve a few critical issues such as morphological defects and placement errors [3]. The morphological defect here indicates the PS residual layer lying between the vertical PMMA cylinder and the substrate, which prevents the PMMA cylinder from touching to the bottom surface. Such underlying defects cannot be observed by conventional approach with the top-down SEM images. In this study, we have utilized a simplified model, so-called the Ohta- Kawasaki (OK) model [4-5] to optimize the DSA hole shrink process. The advantages of the OK model are considerably low computational expense and reasonable accuracy. First, we demonstrated that the OK model could indeed predict complicated, three-dimensional morphologies of the diblock copolymer in the pre-patterned hole. All the results were computed within one minute, and they were reasonably comparable to those obtained from the self-consistent field theory (SCFT) [6]. Then, we calibrated the model parameters with the cross-sectional TEM images, minimizing the errors between the simulated thickness of PS residual layer and the experimental data. The calibrated model was used for the optimization of the guide hole shape and for the exploration of the multi-cylinder case.
Bit patterned media (BPM) is a candidate for high-density magnetic recording. One of the critical issues
concerning high-density BPM is a fine pattern drawing process for an etching mask. A self-assembled polymer is a
solution for the fine etching mask material realizing a density of more than several Tb/in2. The remaining issue
concerning the self-assembled mask is servo pattern formation with the self-assembled dots. This paper reports
fabrication of a ridge-and-groove servo pattern with arrays of
35nm-pitch self-assembled CoPt magnetic dots and signal
properties of the servo pattern are estimated. Dot size and alignment was not uniform in the servo pattern because of the
deviation of the guide width and the taper at the guide edge. This feature will result in a distorted servo signal profile.
However, the numerical estimation based on the fabricated servo patterns revealed that the linearity of the position error
signal was fairly good. The distortion in waveform does not degrade the phase information of the servo signal, provided
the guide is positioned with high precision. Thus the
ridge-and-groove servo is suitable for self-assembled bit patterned
media.
KEYWORDS: Digital video discs, Dysprosium, Data storage, Stereolithography, Laser stabilization, Reflectivity, Ultraviolet radiation, Signal processing, Clocks, Optical discs
High speed HD DVD-R disc with low-to-high polarity organic dye was developed. For development of organic
dye, Type A and Type B having different properties in sensitivity and read stability were examined. 4x speed
recording is possible with both Type A and Type B. Furthermore, in type B, the sufficient signal characteristics
were obtained at 5x speed recording for single layer disc and 2x speed recording for dual layer disc.
For achieving higher density optical discs, it is quite important to decreasing a track pitch without deteriorating the signal to noise ratio. For this purpose, an optical disc of the land recording type having a very small groove width has already been proposed.
For multi-media applications, a higher density rewritable optical disk with a reduced track pitch becomes extremely important. To narrow the track pitch, increasing the groove depth of the land/groove recording type optical disk has been proposed. Not only magnetooptical recording systems but also phase-change recording systems can be applied to the deeper groove technique which gives wider recording power margin in addition to the cross-erase suppression, so that the high density rewritable optical recording systems will be steadily realized without shorter wavelength laser diodes.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.